Genesis and Evolution of Surface Species during Pt Atomic Layer Deposition on Oxide Supports Characterized by in Situ XAFS Analysis and Water-Gas Shift Reaction

被引:124
作者
Setthapun, Worajit [1 ]
Williams, W. Damion [2 ]
Kim, Seung Min [2 ]
Feng, Hao [1 ]
Elam, Jeffrey W. [3 ]
Rabuffetti, Federico A. [4 ]
Poeppelmeier, Kenneth R. [4 ]
Stair, Peter C. [1 ,4 ]
Stach, Eric A. [2 ]
Ribeiro, Fabio H. [2 ]
Miller, Jeffrey T. [1 ]
Marshall, Christopher L. [1 ]
机构
[1] Argonne Natl Lab, Chem Sci & Engn Div, Argonne, IL 60439 USA
[2] Purdue Univ, W Lafayette, IN 47907 USA
[3] Argonne Natl Lab, Div Energy Syst, Argonne, IL 60439 USA
[4] Northwestern Univ, Dept Chem, Evanston, IL 60208 USA
关键词
CHEMICAL-VAPOR-DEPOSITION; THIN-FILMS; PLATINUM NANOPARTICLES; METAL-CATALYSTS; GROWTH; HYDROGENATION; TEMPERATURE; RUTHENIUM; MECHANISM; NANOCUBES;
D O I
10.1021/jp911178m
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Platinum atomic layer deposition (ALD) using MeCpPtMe3 was employed to prepare high loadings of uniform-sized, 1-2 nm Pt nanoparticles on high surface area Al2O3, TiO2, and SrTiO3 supports. X-ray absorption fine structure was utilized to monitor the changes in the Pt species during each step of the synthesis. The temperature, precursor exposure time, treatment gas, and number of ALD cycles were found to affect the Pt particle size and density. Lower-temperature MeCpPtMe3 adsorption yielded smaller particles due to reduced thermal decomposition. A 300 degrees C air treatment of the adsorbed MeCpPtMe3 leads to PtO. In subsequent ALD cycles, the MeCpPtMe3 reduces the PtO to metallic Pt in the ratio of one precursor molecule per PtO. A 200 degrees C H-2 treatment of the adsorbed MeCpPtMe3 leads to the formation of 1-2 nm, metallic Pt nanoparticles. During subsequent ALD cycles, MeCpPtMe3 adsorbs on the support, which, upon reduction, yields additional Pt nanoparticles with a minimal increase in size of the previously formed nanoparticles. The catalysts produced by ALD had identical water-gas shift reaction rates and reaction kinetics to those of Pt catalysts prepared by standard solution methods. ALD synthesis of catalytic nanoparticles is an attractive method for preparing novel model and practical catalysts.
引用
收藏
页码:9758 / 9771
页数:14
相关论文
共 36 条
[1]  
Aaltonen T, 2004, ADVANCED METALLIZATION CONFERENCE 2004 (AMC 2004), P663
[2]   Atomic layer deposition of noble metals:: Exploration of the low limit of the deposition temperature [J].
Aaltonen, T ;
Ritala, M ;
Tung, YL ;
Chi, Y ;
Arstila, K ;
Meinander, K ;
Leskelä, M .
JOURNAL OF MATERIALS RESEARCH, 2004, 19 (11) :3353-3358
[3]   Atomic layer deposition of iridium thin films [J].
Aaltonen, T ;
Ritala, M ;
Sammelselg, V ;
Leskelä, M .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2004, 151 (08) :G489-G492
[4]   Reaction mechanism studies on atomic layer deposition of ruthenium and platinum [J].
Aaltonen, T ;
Rahtu, A ;
Ritala, M ;
Leskelä, M .
ELECTROCHEMICAL AND SOLID STATE LETTERS, 2003, 6 (09) :C130-C133
[5]   Atomic layer deposition of platinum thin films [J].
Aaltonen, T ;
Ritala, M ;
Sajavaara, T ;
Keinonen, J ;
Leskelä, M .
CHEMISTRY OF MATERIALS, 2003, 15 (09) :1924-1928
[6]   Ruthenium thin films grown by atomic layer deposition [J].
Aaltonen, T ;
Alén, P ;
Ritala, M ;
Leskelä, M .
CHEMICAL VAPOR DEPOSITION, 2003, 9 (01) :45-49
[7]  
Bartholomew C.H., 2005, Fundamentals of Industrial Catalytic Processes
[8]   Effect of Zn addition on the water-gas shift reaction over supported palladium catalysts [J].
Bollmann, Luis ;
Ratts, Joshua L. ;
Joshi, Ajay M. ;
Williams, W. Damion ;
Pazmino, Jorge ;
Joshi, Yogesh V. ;
Miller, Jeffrey T. ;
Kropf, A. Jeremy ;
Delgass, W. Nicholas ;
Ribeiro, Fabio H. .
JOURNAL OF CATALYSIS, 2008, 257 (01) :43-54
[9]   Analysis of in situ EXAFS data of supported metal catalysts using the third and fourth cumulant [J].
Bus, Eveline ;
Miller, Jeffrey T. ;
Kropf, A. Jeremy ;
Prins, Roel ;
van Bokhoven, Jeroen A. .
PHYSICAL CHEMISTRY CHEMICAL PHYSICS, 2006, 8 (27) :3248-3258
[10]  
CHRISTENSEN ST, 2010, CHEM MAT IN PRESS