Vanishing of the impurity binding energy in n-doped In0.53Ga0.47As/InP quantum wells

被引:2
作者
Lima, FMS [1 ]
Lapas, LC [1 ]
Morais, PC [1 ]
机构
[1] Univ Brasilia, Inst Fis Nucl Fis Aplicada, BR-70919970 Brasilia, DF, Brazil
关键词
impurity levels; semiconductor-metal transition; quantum wells;
D O I
10.1016/S1386-9477(02)00666-5
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
This study develops a variational approach to calculate the binding energy of a shallow hydrogenic impurity in a n-doped In0.53Ga0.47As/InP single quantum well. Using a proper trial wavefunction, both Schrodinger and Poisson equations were solved simultaneously within-the effective mass: approximation, taking into account finite well barriers, finite temperatures, and different effective masses and dielectric constants along the growth direction. Band bending, screening, and many-body effects were considered and it is found these effects reduce drastically the impurity binding energy and lead to the vanishing of this energy when the 2DEG density reaches a critical value. Our results show that such a vanishing occurs even for very thin quantum wells, contrarily to recent calculations developed for GaAs/AlGaAs quantum wells. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:190 / 198
页数:9
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