Theoretical approach to initial growth kinetics of GaN on GaN(001)

被引:21
作者
Kangawa, Y.
Matsuo, Y.
Akiyama, T.
Ito, T.
Shiraishi, K.
Kakimoto, K.
机构
[1] Kyushu Univ, Res Inst Appl Mech, Kasuga, Fukuoka 8168580, Japan
[2] Mie Univ, Dept Engn Phys, Tsu, Mie 5148507, Japan
[3] Univ Tsukuba, Inst Phys, Tsukuba, Ibaraki 3058571, Japan
关键词
adsorption; molecular beam epitaxy; c-GaN;
D O I
10.1016/j.jcrysgro.2006.10.203
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
We carried out theoretical analyses based on ab initio calculations incorporates in which free energy of the vapor phase is incorporated in order to determine the initial growth kinetics of c-GaN on GaN(0 0 1)-(4 x 1). The feasibility of the theoretical approach had been confirmed by calculations of Ga adsorption-desorption transition temperature and transition beam equivalent pressures on the GaAs(0 0 1)-(4 x 2)beta 2 surface in our previous work [Y. Kangawa, T. Ito, A. Taguchi, K. Shiraishi, T. Ohachi, Surf. Sci. 493 (2001) 178]. The results of calculations suggest that no Ga adsorption occurs on the initial surface under typical growth conditions but that a Ga adsorption site appears after N adsorption on GaN(0 0 1)-(4 x 1). That is, in the initial growth stage of c-GaN on GaN(0 0 1)-(4 x 1), a N-adsorbed structure is formed and then Ga adsorbs on the N adatom. (c) 2006 Elsevier B.V. All rights reserved.
引用
收藏
页码:62 / 65
页数:4
相关论文
共 15 条
[1]   Scanning tunneling microscopy and surface simulation of zinc-blende GaN(001) intrinsic 4x reconstruction:: Linear gallium tetramers? -: art. no. 146102 [J].
AL-Brithen, HAH ;
Yang, R ;
Haider, MB ;
Constantin, C ;
Lu, ED ;
Smith, AR ;
Sandler, N ;
Ordejón, P .
PHYSICAL REVIEW LETTERS, 2005, 95 (14)
[2]   INHOMOGENEOUS ELECTRON-GAS [J].
RAJAGOPAL, AK ;
CALLAWAY, J .
PHYSICAL REVIEW B, 1973, 7 (05) :1912-1919
[3]   Theoretical investigations of initial growth process on GaAs(001) surfaces [J].
Ito, T ;
Shiraishi, K .
SURFACE SCIENCE, 1997, 386 (1-3) :241-244
[4]   A Monte Carlo simulation study on the structural change of the GaAs(001) surface during MBE growth [J].
Ito, T ;
Shiraishi, K .
SURFACE SCIENCE, 1996, 357 (1-3) :486-489
[5]   Theoretical approach to influence of As2 pressure on GaAs growth kinetics [J].
Kangawa, Y ;
Ito, T ;
Hiraoka, YS ;
Taguchi, A ;
Shiraishi, K ;
Ohachi, T .
SURFACE SCIENCE, 2002, 507 :285-289
[6]   A new theoretical approach to adsorption-desorption behavior of Ga on GaAs surfaces [J].
Kangawa, Y ;
Ito, T ;
Taguchi, A ;
Shiraishi, K ;
Ohachi, T .
SURFACE SCIENCE, 2001, 493 (1-3) :178-181
[7]   Thick cubic GaN film growth using ultra-thin low-temperature buffer layer by RF-MBE [J].
Kimura, R ;
Suzuki, T ;
Ouchi, M ;
Ishida, K ;
Takahashi, K .
JOURNAL OF CRYSTAL GROWTH, 2005, 278 (1-4) :411-414
[8]   SELF-CONSISTENT EQUATIONS INCLUDING EXCHANGE AND CORRELATION EFFECTS [J].
KOHN, W ;
SHAM, LJ .
PHYSICAL REVIEW, 1965, 140 (4A) :1133-&
[9]   Clean and As-covered zinc-blende GaN (001) surfaces: Novel surface structures and surfactant behavior [J].
Neugebauer, J ;
Zywietz, T ;
Scheffler, M ;
Northrup, JE ;
Van de Walle, CG .
PHYSICAL REVIEW LETTERS, 1998, 80 (14) :3097-3100
[10]   Growth and characterization of cubic GaN [J].
Okumura, H ;
Ohta, K ;
Feuillet, G ;
Balakrishnan, K ;
Chichibu, S ;
Hamaguchi, H ;
Hacke, P ;
Yoshida, S .
JOURNAL OF CRYSTAL GROWTH, 1997, 178 (1-2) :113-133