Chemical kinetics of low pressure high density hydrogen plasmas: application to negative ion sources for ITER

被引:29
作者
Gaboriau, F. [1 ,2 ]
Boeuf, J. P. [1 ,2 ]
机构
[1] Univ Toulouse 3, UPS, INPT, LAPLACE Lab Plasma & Convers Energie, F-31062 Toulouse 9, France
[2] CNRS, LAPLACE, F-31062 Toulouse, France
关键词
H-2; kinetics; low pressure high density plasma; global model; VIBRATIONAL KINETICS; CROSS-SECTION; ELECTRON; H-2; EXCITATION; FREQUENCY; ARGON; IMPRISONMENT; MOLECULES; DISCHARGE;
D O I
10.1088/0963-0252/23/6/065032
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
This paper presents a systematic kinetic characterization of a low pressure high power hydrogen plasma. The plasma physics is described with a global model coupled to a homogeneous kinetic model for hydrogen. This model involves reactions which describe the vibrational and electronic excited kinetics of H-2, the positive (H+, H-2(+), H-3(+)) and negative (H-) ion kinetics and the H chemistry. This enables the estimation of the particle density and the electron temperature and their evolutions as a function of power (1-100 kW) and pressure (0.3-4 Pa). These very specific plasma conditions involve physical phenomena not occurring in more usual plasmas, such as gas depletion. To account for this gas depletion, we incorporate in the global model both the H neutral heat equation to calculate the H temperature, and the gas pumping. Indeed, the gas depletion is mainly due to H atom heating leading to a higher pumping loss for H atoms. The consideration of the gas depletion allows us to obtain similar behaviors to the experiments when varying power and pressure. From an accurate analysis of the main formation and destruction pathways for each particle, the species kinetics is discussed and a simplified kinetic model that may be used to describe the non-equilibrium plasma in the negative source for ITER is proposed. Finally, the results point to strong coupling existing between the H atom wall recombination coefficient gamma(H) and the gas depletion. An increase of gamma(H) reduces the gas depletion, affecting the electron temperature and the electron density as well as the whole plasma kinetics.
引用
收藏
页数:16
相关论文
共 55 条
[21]  
Janev K, 2003, 4105 FZ JUEL
[22]   Hydrogen plasma interaction with (100) diamond surfaces [J].
John, Phillip ;
Stoikou, Maria D. .
PHYSICAL CHEMISTRY CHEMICAL PHYSICS, 2011, 13 (24) :11503-11510
[23]   Atomic hydrogen densities in capacitively coupled very high-frequency plasmas in H2:: Effect of excitation frequency -: art. no. 103305 [J].
Jolly, J ;
Booth, JP .
JOURNAL OF APPLIED PHYSICS, 2005, 97 (10)
[24]   Modeling and experimental study of molecular nitrogen dissociation in an Ar-N2 ICP discharge [J].
Kang, Namjun ;
Gaboriau, Freddy ;
Oh, Soo-Ghee ;
Ricard, Andre .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 2011, 20 (04)
[25]   Improved volume-averaged model for steady and pulsed-power electronegative discharges [J].
Kim, Sungjin ;
Lieberman, M. A. ;
Lichtenberg, A. J. ;
Gudmundsson, J. T. .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2006, 24 (06) :2025-2040
[26]   Hydrogen etching of Si3N4 layers with plasma assisted hot wire CVD [J].
Kniffler, Norbert ;
Pflueger, Andrea ;
Schulz, Tobias ;
Sommer, Sven ;
Schroeder, Bernd .
THIN SOLID FILMS, 2011, 519 (14) :4582-4584
[27]   Modelling electronegative discharges at low pressure [J].
Kouznetsov, IG ;
Lichtenberg, AJ ;
Lieberman, MA .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 1996, 5 (04) :662-676
[28]   Interaction of Argon, Hydrogen and Oxygen Plasma Early Afterglow with Polyvinyl Chloride (PVC) Materials [J].
Kregar, Zlatko ;
Biscan, Marijan ;
Milosevic, Slobodan ;
Mozetic, Miran ;
Vesel, Alenka .
PLASMA PROCESSES AND POLYMERS, 2012, 9 (10) :1020-1027
[29]   Surface induced dissociation in slow collisions of H2+ and O2+:: information from the ion impact electron spectra [J].
Krischok, S ;
Müller, H ;
Kempter, V .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1999, 157 (1-4) :198-207
[30]   GLOBAL-MODEL OF AR, O-2, CL-2, AND AR/O-2 HIGH-DENSITY PLASMA DISCHARGES [J].
LEE, C ;
LIEBERMAN, MA .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1995, 13 (02) :368-380