The formation of multi-axis micromechanical gyroscopes and accelerometers using surface micromachining

被引:2
作者
Gusev, E. Yu [1 ]
Jityaeva, J. Y. [1 ]
Bykov, Al V. [1 ]
机构
[1] Southern Fed Univ, Inst Nanotechnol Elect & Elect Equipment Engn, Taganrog 347922, Russia
来源
INTERNATIONAL CONFERENCE PHYSICA.SPB/2016 | 2017年 / 929卷
关键词
POLYSILICON; MEMS; OXIDE;
D O I
10.1088/1742-6596/929/1/012055
中图分类号
O59 [应用物理学];
学科分类号
摘要
The process flow of unified integral multi-axis micromechanical gyroscopes and accelerometers fabrication by surface micromachining was developed. The process flow for typical n-type silicon wafer Si (100) contains over 20 primary operations, including 5 lithography steps using 5 masks with minimum features size of 1 jam. Special operations were discussed. Experimental results of sacrificial SiO2 etching for poly-Si-on-SiO2 structures using buffered solution of hydrofluoric acid and ammonium fluoride (1:4) were obtained. The undercut etching rate was approximately of about 20 nm/sec and the minimum time required for sacrificial SiO2 removing under beams of 0.5-2.5 width was in in the range of 11 to 62.5 seconds. Finally two and three-axis micromechanical gyroscopes and accelerometers were fabricated.
引用
收藏
页数:5
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