Applications of ToF-SIMS for imaging and depth profiling commercial materials

被引:6
作者
Clark, Paula A. [1 ]
Hagenhoff, Birgit [2 ]
Kersting, Reinhard [2 ]
Tallarek, Elke [2 ]
机构
[1] Tascon USA, 100 Red Schoolhouse Rd,Suite A8, Chestnut Ridge, NY 10977 USA
[2] Tascon GmbH, Mendelstr 17, D-48149 Munster, Germany
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2016年 / 34卷 / 03期
关键词
ION MASS-SPECTROMETRY; POLYMER SURFACES; CLUSTER; SF5+; PROJECTILES; ENERGY; BEAMS; C-60; BOMBARDMENT; TOPOGRAPHY;
D O I
10.1116/1.4944388
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The development of cluster primary ion sources such as Au-n(+), Bi-n(+), SF5+, C-60(+), and Ar-n(+) has been an exciting advancement in SIMS analysis. Relative to atomic primary ion sources, cluster ion sources provide higher secondary ion yields. Furthermore, C-60(+) and Ar-n(+) impart significantly less chemical damage to the sample thus enabling molecular depth profiling. Molecular depth profiling using cluster primary ion sources is routinely used to characterize a wide range of commercially important materials, including organic light emitting diode, biomaterials and pharmaceuticals, adhesives, and architectural paints and coatings. This paper highlights the application of time of flight secondary ion mass spectrometry (ToF-SIMS) to study contact lenses and acrylic-based paints. In the first application, ToF-SIMS was used to investigate the surface composition of two commercial contact lenses. Lens material I is composed of 2-hydroxy-ethyl methacrylate (HEMA) and glycerol methacrylate while lens material II is composed of HEMA and 2-methacryloxyethyl phosphorylcholine cross-linked with ethyleneglycol dimethacrylate. The ToF-SIMS data confirm the presence of the 2-methacryloxyethyl phosphorylcholine on the surface of lens material II. ToF-SIMS was also used to characterize a HEMA-based contact lens which had been worn for about 4 weeks. The analysis reveals the presence of N-containing species, fatty acids, phosphorylcholine, and dioctyldecyl dimethyl ammonium. Ar-n(+) gas cluster ion beams (GCIB) depth profiling indicates the N-containing species, the fatty acids, and the dioctyldecyl dimethyl ammonium are concentrated at the surface. In the second application, a combination of O-2(+) and Ar-n(+) GCIB depth profiling was used to study the pigment levels in acrylic-based paints. The O-2(+) beam was used to profile into the bulk of the dried paint film and Ar-n(+) gas cluster beam was then used to remove the damaged material. ToF-SIMS analysis of the crater bottom reveals differences in pigment levels. The combined O-2(+) and Ar-n(+) GCIB depth profiling is an effective way of characterizing materials composed of both organic and inorganic components. (C) 2016 American Vacuum Society.
引用
收藏
页数:7
相关论文
共 34 条
[21]   Depth profiling of poly(L-lactic acid)/triblock copolymer blends with time-of-flight secondary ion mass spectrometry [J].
Mahoney, CM .
ANALYTICAL CHEMISTRY, 2005, 77 (11) :3570-3578
[22]  
Maissa C, 1998, OPTOMETRY VISION SCI, V75, P697
[23]   A new secondary ion mass spectrometry (SIMS) system with high-intensity cluster ion source [J].
Matsuo, J ;
Okubo, C ;
Seki, T ;
Aoki, T ;
Toyoda, N ;
Yamada, I .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2004, 219 :463-467
[24]   What size of cluster is most appropriate for SIMS? [J].
Matsuo, Jiro ;
Ninomiya, Satoshi ;
Nakata, Yoshihiko ;
Honda, Yoshiro ;
Ichiki, Kazuya ;
Seki, Toshio ;
Aoki, Takaaki .
APPLIED SURFACE SCIENCE, 2008, 255 (04) :1235-1238
[25]   TOF-SIMS with Argon Gas Cluster Ion Beams: A Comparison with C60+ [J].
Rabbani, Sadia ;
Barber, Andrew M. ;
Fletcher, John S. ;
Lockyer, Nicholas P. ;
Vickerman, John C. .
ANALYTICAL CHEMISTRY, 2011, 83 (10) :3793-3800
[26]   Reaction dynamics following keV cluster bombardment [J].
Ryan, Kathleen E. ;
Wojciechowski, Igor A. ;
Garrison, Barbara J. .
JOURNAL OF PHYSICAL CHEMISTRY C, 2007, 111 (34) :12822-12826
[27]   Mechanism for increased yield with SF5+ projectiles in organic SIMS:: The substrate effect [J].
Townes, JA ;
White, AK ;
Wiggins, EN ;
Krantzman, KD ;
Garrison, BJ ;
Winograd, N .
JOURNAL OF PHYSICAL CHEMISTRY A, 1999, 103 (24) :4587-4589
[28]   Secondary ion mass spectrometry with gas cluster ion beams [J].
Toyoda, N ;
Matsuo, J ;
Aoki, T ;
Yamada, I ;
Fenner, DB .
APPLIED SURFACE SCIENCE, 2003, 203 :214-218
[29]  
VanStipdonk MJ, 1996, RAPID COMMUN MASS SP, V10, P1987
[30]   Molecular ion emission from single large cluster impacts [J].
Verkhoturov, S. V. ;
Rickman, R. D. ;
Guillemier, C. ;
Hager, G. J. ;
Locklear, J. E. ;
Schweikert, E. A. .
APPLIED SURFACE SCIENCE, 2006, 252 (19) :6490-6493