Structures and properties of ceramic films on TiAl intermetallic compound fabricated by microarc oxidation

被引:25
作者
Li, Xijin
Wu, Xiaoling [1 ]
Xue, Wenbin
Cheng, Guoan
Zheng, Ruiting
Cheng, Yunjun
机构
[1] Beijing Normal Univ, Beijing Radiat Ctr, Dept Mat Sci & Engn, Minist Educ,Key Lab Beam Technol, Beijing 100875, Peoples R China
[2] Res Ctr Ti Al Intermet Compound, High Temperature Mat Res Div, Gen Iron & Steel Inst, Beijing 100081, Peoples R China
基金
中国国家自然科学基金;
关键词
microarc oxidation; TiAl; microstructure; oxidation resistance;
D O I
10.1016/j.surfcoat.2006.07.129
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The ceramic oxide films with a thickness of 120 mu m were prepared on gamma-TiAl intermetallic compound by alternating-current microarc oxidation in silicate electrolyte. Isothermal oxidation of TiAl alloy coated with the ceramic oxide film was carried out in air at 1100 degrees C. Result showed that the dense layers in the oxide film were mainly composed of Al2TiO5 and TiO2 rutile phase, while the loose layer contained a large amount of amorphous SiO2 besides Al2TiO5 and TiO2 rutile phase. Thermal shock tests revealed a good adhesion between the films and TiAl substrate, and the oxidation resistance of the TiAl alloy was improved. (C) 2006 Elsevier B.V. All rights reserved.
引用
收藏
页码:5556 / 5559
页数:4
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