Ion density evolution in a high-power sputtering discharge with bipolar pulsing

被引：61

作者：

Britun, N. ^{[1
]}

Michiels, M. ^{[1
,2
]}

Godfroid, T. ^{[2
]}

Snyders, R. ^{[1
,2
]}

机构：

[1] Univ Mons, CIRMAP, Chim Interact Plasma Surface ChIPS, 23 Pl Parc, B-7000 Mons, Belgium

[2] Parc Initialis, Mat Nova Res Ctr, B-7000 Mons, Belgium

来源：

APPLIED PHYSICS LETTERS | 2018年 / 112卷 / 23期

关键词：

MAGNETIC-FIELD; DEPOSITION; DURATION;

D O I：

10.1063/1.5030697

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Time evolution of sputtered metal ions in high power impulse magnetron sputtering (HiPIMS) discharge with a positive voltage pulse applied after a negative one (regime called "bipolar pulse HiPIMS"-BPH) is studied using 2-D density mapping. It is demonstrated that the ion propagation dynamics is mainly affected by the amplitude and duration of the positive pulse. Such effects as ion repulsion from the cathode and the ionization zone shrinkage due to electron drift towards the cathode are clearly observed during the positive pulse. The BPH mode also alters the film crystallo-graphic structure, as observed from X-ray diffraction analysis. Published by AIP Publishing.

引用

页数：5

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