Electrical and luminescent properties and deep traps spectra of N-polar GaN films

被引:10
|
作者
Polyakov, A. Y. [1 ]
Smirnov, N. B. [1 ]
Govorkov, A. V. [1 ]
Sun, Q. [2 ]
Zhang, Y. [2 ]
Cho, Y. S. [2 ]
Lee, I. -H. [2 ]
Han, J. [2 ]
机构
[1] Inst Rare Met, Moscow 119017, Russia
[2] Yale Univ, Dept Elect Engn, New Haven, CT 06520 USA
来源
MATERIALS SCIENCE AND ENGINEERING B-ADVANCED FUNCTIONAL SOLID-STATE MATERIALS | 2010年 / 166卷 / 01期
基金
美国能源部;
关键词
III-Nitrides; MOCVD; N-polar; Deep traps; CHEMICAL-VAPOR-DEPOSITION; FACE ALGAN/GAN HETEROSTRUCTURES; MOLECULAR-BEAM EPITAXY; C-PLANE SAPPHIRE; IMPURITY INCORPORATION; PHASE EPITAXY; DEFECTS; GROWTH; IRRADIATION; MORPHOLOGY;
D O I
10.1016/j.mseb.2009.10.011
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Electrical and luminescent properties of N-polar undoped GaN films grown using low temperature GaN buffers on on-axis and miscut sapphire and on-axis AlN buffers are compared to the properties of Ga-polar films grown on low temperature GaN buffers. It is shown that the concentration of residual donors increases by about an order of magnitude for on-axis N-polar growth and by two orders of magnitude for off-axis growth compared to Ga-polar films. On-axis films for both Ga-polar and N-polar polarities show the presence of n(+) interfacial layers greatly influencing the apparent electron concentration and mobility deduced from capacitance-voltage C-V measurements. These interfacial layers are much less prominent in the miscut N-polar films. Growth on N-polar greatly increases the concentration of electron traps with activation energy of 0.9 eV possibly related to Ga-interstitials. (C) 2009 Elsevier B.V. All rights reserved.
引用
收藏
页码:83 / 88
页数:6
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