Lasing in Group-IV Materials

被引:16
作者
Reboud, V. [1 ]
Buca, D. [2 ,3 ]
Sigg, H. [4 ]
Hartmann, J. M. [1 ]
Ikonic, Z. [5 ]
Pauc, N. [6 ]
Calvo, V. [6 ]
Rodriguez, P. [1 ]
Chelnokov, A. [1 ]
机构
[1] Univ Grenoble Alpes, CEA, LETI, F-38054 Grenoble, France
[2] Forschungszentrum Julich, Peter Grunberg Inst 9 PGI 9, Inst Semicond Nanoelect, D-52074 Julich, Germany
[3] Forschungszentrum Julich, JARA Fundamentals Future Informat Technol, D-52074 Julich, Germany
[4] Paul Scherrer Inst, Lab Micro & Nanotechnol, CH-5232 Villigen, Switzerland
[5] Univ Leeds, Sch Elect & Elect Engn, Pollard Inst, Leeds, W Yorkshire, England
[6] Univ Grenoble Alpes, CEA, IRIG DePhy, F-38054 Grenoble, France
来源
SILICON PHOTONICS IV: INNOVATIVE FRONTIERS | 2021年 / 139卷
基金
瑞士国家科学基金会;
关键词
CHEMICAL-VAPOR-DEPOSITION; SOLID-STATE REACTION; TENSILE-STRAINED GE; WAVE INFRARED LEDS; DIRECT-BAND-GAP; GERMANIUM-TIN; MU-M; N PHOTODETECTOR; LIGHT-EMISSION; OPTICAL GAIN;
D O I
10.1007/978-3-030-68222-4_3
中图分类号
TP301 [理论、方法];
学科分类号
081202 ;
摘要
Silicon photonics in the near-IR, up to 1.6 mu m, is already one of key technologies in optical data communications, particularly short range. It also is being prospected for applications in quantum computing, artificial intelligence, optical signal processing, where complex photonic integration is to be combined with a large-volume fabrication. However, silicon photonics does not yet cover a large portion of applications in the mid-IR. In the wavelength range of 2-5 mu m, environmental sensing, life sensing and security, all rely on optical signatures of molecular vibrations to identify complex individual chemical species. The markets for such analysis are huge and constantly growing, with a push for sensitivity, specificity, compactness, low-power operation and low cost. An all-group-IV, CMOS-compatible mid-IR integrated photonic platform would be a key enabler in this wavelength range. As for other wavelengths, such a platform should be complete with low-loss guided interconnects, detectors, eventually modulators, and most important an efficient and integrated light sources. This chapter reviews the recent developments of mid-IR silicon-compatible optically and electrically pumped lasers, light emitting diodes and photodetectors based on Ge, GeSn and SiGeSn alloys. It contains insights into the fundamentals of these developments, including bandstructure modelling, material growth and processing techniques.
引用
收藏
页码:105 / 195
页数:91
相关论文
共 249 条
  • [11] Very Low Temperature Epitaxy of Heavily In Situ Phosphorous Doped Ge Layers and High Sn Content GeSn Layers
    Aubin, J.
    Hartmann, J. M.
    Barnes, J. P.
    Pin, J. B.
    Bauer, M.
    [J]. ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY, 2017, 6 (01) : P21 - P26
  • [12] THE MEASUREMENT OF THREADING DISLOCATION DENSITIES IN SEMICONDUCTOR CRYSTALS BY X-RAY-DIFFRACTION
    AYERS, JE
    [J]. JOURNAL OF CRYSTAL GROWTH, 1994, 135 (1-2) : 71 - 77
  • [13] Bahder T.B., 1992, PHYS REV B, V41, P9913
  • [14] Growth of highly tensile-strained Ge on relaxed InxGa1-xAs by metalorganic chemical vapor deposition
    Bai, Yu
    Lee, Kenneth E.
    Cheng, Chengwei
    Lee, Minjoo L.
    Fitzgerald, Eugene A.
    [J]. JOURNAL OF APPLIED PHYSICS, 2008, 104 (08)
  • [15] Low-threshold optically pumped lasing in highly strained germanium nanowires
    Bao, Shuyu
    Kim, Daeik
    Onwukaeme, Chibuzo
    Gupta, Shashank
    Saraswat, Krishna
    Lee, Kwang Hong
    Kim, Yeji
    Min, Dabin
    Jung, Yongduck
    Qiu, Haodong
    Wang, Hong
    Fitzgerald, Eugene A.
    Tan, Chuan Seng
    Nam, Donguk
    [J]. NATURE COMMUNICATIONS, 2017, 8
  • [16] Quantum confinement in Si and Ge nanostructures: Theory and experiment
    Barbagiovanni, Eric G.
    Lockwood, David J.
    Simpson, Peter J.
    Goncharova, Lyudmila V.
    [J]. APPLIED PHYSICS REVIEWS, 2014, 1 (01):
  • [17] Compositional dependence of the absorption edge and dark currents in Ge1-x-ySixSny/Ge(100) photodetectors grown via ultra-low-temperature epitaxy of Ge4H10, Si4H10, and SnD4
    Beeler, R. T.
    Xu, Chi
    Smith, D. J.
    Grzybowski, G.
    Menendez, J.
    Kouvetakis, J.
    [J]. APPLIED PHYSICS LETTERS, 2012, 101 (22)
  • [18] Bertrand M., 2019, IEEE INT CONF GROUP, DOI 10.1109/GROUP4.2019.8853926
  • [19] Anti-phase boundaries-Free GaAs epilayers on "quasi-nominal" Ge-buffered silicon substrates
    Bogumilowicz, Y.
    Hartmann, J. M.
    Cipro, R.
    Alcotte, R.
    Martin, M.
    Bassani, F.
    Moeyaert, J.
    Baron, T.
    Pin, J. B.
    Bao, X.
    Ye, Z.
    Sanchez, E.
    [J]. APPLIED PHYSICS LETTERS, 2015, 107 (21)
  • [20] Local uniaxial tensile strain in germanium of up to 4% induced by SiGe epitaxial nanostructures
    Bollani, Monica
    Chrastina, Daniel
    Gagliano, Luca
    Rossetto, Lidia
    Scopece, Daniele
    Barget, Michael
    Mondiali, Valeria
    Frigerio, Jacopo
    Lodari, Mario
    Pezzoli, Fabio
    Montalenti, Francesco
    Bonera, Emiliano
    [J]. APPLIED PHYSICS LETTERS, 2015, 107 (08)