The effect of H2S on diamond homoepitaxy

被引:0
|
作者
Gamo, MN [1 ]
Xiao, C [1 ]
Zhang, Y [1 ]
Ando, T [1 ]
机构
[1] Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058577, Japan
来源
DIAMOND MATERIALS VII, PROCEEDINGS | 2001年 / 2002卷 / 25期
关键词
diamond; homoepitaxy; CVD; doping; AFM;
D O I
暂无
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
To gain an understanding of the effect the addition of H,S has on sulfur-doped diamond growth, we focused on how the smoothness of the growing surface varied with the addition of H2S. We found that the distance between the plasma and the surface, i.e., the interaction between the plasma and the growing surface, influenced the effect the addition of H2S had on surface smoothness. The substrate temperature also influenced the effect the H2S had on surface smoothness. We were able to find a key factor to increasing the amount of the active carrier in sulfur-doped diamonds.
引用
收藏
页码:200 / 210
页数:11
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