Beam-splitting ZnSe diffractive optical element

被引：3

作者：

Kurisu, K ^{[1
]}

Hirai, T ^{[1
]}

Ushiro, T ^{[1
]}

Fuse, K ^{[1
]}

Okada, T ^{[1
]}

Ebata, K ^{[1
]}

机构：

[1] Sumitomo Elect Ind Ltd, Itami R&D Labs, Machining Engn R&D Dept, Konohana Ku, Osaka 5540024, Japan

来源：

THIRD INTERNATIONAL SYMPOSIUM ON LASER PRECISION MICROFABRICATION | 2003年 / 4830卷

关键词：

ZnSe polycrystal; Diffractive Optical Element; reactive ion etching; microfabricated pattern; boron trichloride; surface roughness; side wall;

D O I：

10.1117/12.486527

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

ZnSe Diffractive Optical Element (DOE) is one of the advanced optics which utilizes the optical diffraction phenomena by fabricating a micron order pattern on polished mirror-like surface of ZnSe polycrystal substrate. Various applications for a carbon dioxide (CO2) laser material processing such as beam-splitting, beam-shaping and beam-homogenizing Are available. The micro pattern of ZnSe DOE is fabricated by the photolithography and reactive ion etching (RIE) technique. Its optical property is highly dependent on the depth precision of microfabricated pattern. In RIE by using BCl3 as the etchant gas we have achieved an etching technique to maintain the smooth surface of the ZnSe polycrystal with minimal etching rate dependency on the crystal orientaion of each crystal grain. The surface roughness is 2mm Ra before etching and 5nm. Ra after about 4 microns depth etching. This good roughness brings better depth precision. With these etching technique beam-splitting ZnSe DOE with less than 10% intensity uniformity of splitted beams is successfully obtained and it can be put to use for practical CO2 laser hole drilling.

引用

页码：313 / 318

页数：6