Realization of cubic ZnMgO photodetectors for UVB applications

被引:47
作者
Fan, Ming-Ming [1 ,2 ]
Liu, Ke-Wei [1 ]
Chen, Xing [1 ]
Zhang, Zhen-Zhong [1 ]
Li, Bing-Hui [1 ]
Zhao, Hai-Feng [1 ]
Shen, De-Zhen [1 ]
机构
[1] Chinese Acad Sci, Changchun Inst Opt Fine Mech & Phys, State Key Lab Luminescence & Applicat, Changchun 130033, Peoples R China
[2] Univ Chinese Acad Sci, Beijing 100049, Peoples R China
基金
中国国家自然科学基金;
关键词
MOLECULAR-BEAM EPITAXY; ULTRAVIOLET PHOTODETECTORS; THIN-FILMS; DETECTORS; SUBSTRATE; LAYERS;
D O I
10.1039/c4tc02188f
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Cubic ZnMgO (c-ZnMgO) with a band gap in the ultraviolet-B (UVB) region was deposited for the first time on the a-face sapphire substrate by molecular beam epitaxy using a thin low-Zn-content ZnMgO film as the buffer layer. The metal-semiconductor-metal photodetectors were demonstrated on this c-ZnMgO with different finger gaps, and their cut-off wavelength is around 320 nm. At 10 V, the device with a finger gap of 2 mu m shows a low dark current of 3 pA, and its peak responsivity at 302 nm is similar to 5.188 A W-1. A further temporal photoresponse study reveals that the c-ZnMgO UVB photodetectors display a fast response speed (90-10% decay time is around 24 mu s) with good reproducibility and stability. Our findings indicate that the present c-ZnMgO UVB photodetectors are very promising for future optoelectronic device applications.
引用
收藏
页码:313 / 317
页数:5
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