Study of Mg ion intercalation in polycrystalline MoO3 thin films

被引:18
作者
Sian, TS
Reddy, GB [1 ]
Shivaprasad, SM
机构
[1] Indian Inst Technol, Dept Phys, Film Lab, New Delhi 110016, India
[2] Natl Phys Lab, Surface Phys Grp, New Delhi 110012, India
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 2004年 / 43卷 / 9A期
关键词
intercalation; core levels; diffusion coefficient; and cyclic voltammetry;
D O I
10.1143/JJAP.43.6248
中图分类号
O59 [应用物理学];
学科分类号
摘要
As-deposited amorphous MoO3 films were found to crystallize into a stable orthorhombic phase on annealing in air at 350degreesC. The feasibility of using Mg ions as intercalants, in polycrystalline MoO3 thin films has been investigated. These ions were intercalated galvanostatically at a constant current density of 166 muA/cm(2). Structural studies carried out on intercalated films, show lattice expansion along b axis by 2.35% for x = 0.1 and 3.17% for x = 0.3. Partial restoration of b-axis is observed on deintecalation. The chemical status of Mo and O ions, before and after intercalation has been investigated using Photoemission Spectroscopy (core level spectra). Core level (CL) of Mo 3d levels indicate the presence of Mo+6 oxidation state only in unintercalated films, with a stoichiometry of MoO3. The intercalated ions are found to reduce Mo ions as revealed by the presence of Mo+5, Mo+4 and Mo+3 states in addition to Mo+6 state. Formation of Mg-O bonds is seen from the CL spectrum of O1s levels. From cyclic voltammetry experiments the estimated diffusion coefficient of Mg ions is found to be of the order of 10(-19) cm(2)/s and the films are stable even after 300 cycles.
引用
收藏
页码:6248 / 6251
页数:4
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