Nanotexturing of Glass Surface by Ultrafast Laser Assisted Wet Etching

被引：0

作者：

Drevinskas, Rokas ^{[1
]}

Gecevicius, Mindaugas ^{[1
]}

Beresna, Martynas ^{[1
]}

Bellouard, Yves ^{[2
]}

Kazansky, Peter G. ^{[1
]}

机构：

[1] Univ Southampton, Optoelect Res Ctr, Southampton SO17 1BJ, Hants, England

[2] Eindhoven Univ Technol, Alechan Engn Dept, Micro & Nano Scale Engn, NL-5600 MB Eindhoven, Netherlands

来源：

2014 CONFERENCE ON LASERS AND ELECTRO-OPTICS (CLEO) | 2014年

关键词：

SILICA;

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Surface texturing with 30 nm resolution is demonstrated by KOH wet etching and ultrafast laser nanostructuring of silica. An increase of three times in retardance is achieved leading to the fabrication of dichroic glass-metal patterns.

引用

页数：2

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