ferroelectric thin films;
dielectric loss;
microwave frequencies;
quasi-Debye loss mechanism;
D O I:
10.1080/10584580490895077
中图分类号:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号:
0808 ;
0809 ;
摘要:
The behavior of dielectric loss in SrTiO3 thin films at different microwave frequencies under the dc bias voltage applied is analyzed. Two types of differently processed SrTiO3 thin films (as deposited and oxygen-annealed) deposited by the pulse laser deposition technique onto MgO single crystal substrate are investigated. The half-wave microstrip resonator with the resonance frequencies being 8 and 16 GHz at the first and second resonance modes respectively was used for the microwave characterization of the investigated thin films. The experimental data obtained strongly suggest the occurrence of a crossover between different dielectric loss contributions (extrinsic and intrinsic) in the films. The crossover is driven by the dc bias field: at weak fields the loss is governed by an extrinsic mechanism(s) whereas, at higher fields, the contribution of an intrinsic mechanism (dc field-induced quasi-Debye loss) becomes predominant. The results obtained allowed us to conclude that the quality of tunable ferroelectric films can be judged from the shape of the field dependence of the loss tangent.
机构:
Pontificia Univ Catolica Rio de Janeiro CETUC PUC, Ctr Estudos Telecomunicacoes, Rio De Janeiro, BrazilPontificia Univ Catolica Rio de Janeiro CETUC PUC, Ctr Estudos Telecomunicacoes, Rio De Janeiro, Brazil
Marulanda, J. I.
Cremona, M.
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Pontificia Univ Catolica Rio de Janeiro PUC Rio, Dept Fis, Rio De Janeiro, BrazilPontificia Univ Catolica Rio de Janeiro CETUC PUC, Ctr Estudos Telecomunicacoes, Rio De Janeiro, Brazil
Cremona, M.
Santos, R.
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Pontificia Univ Catolica Rio de Janeiro PUC Rio, Dept Fis, Rio De Janeiro, BrazilPontificia Univ Catolica Rio de Janeiro CETUC PUC, Ctr Estudos Telecomunicacoes, Rio De Janeiro, Brazil
Santos, R.
Carvalho, M. C. R.
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Pontificia Univ Catolica Rio de Janeiro CETUC PUC, Ctr Estudos Telecomunicacoes, Rio De Janeiro, BrazilPontificia Univ Catolica Rio de Janeiro CETUC PUC, Ctr Estudos Telecomunicacoes, Rio De Janeiro, Brazil
Carvalho, M. C. R.
Demenicis, L. S.
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机构:
Inst Mil Engn, Secao Engn Elect, Rio De Janeiro, BrazilPontificia Univ Catolica Rio de Janeiro CETUC PUC, Ctr Estudos Telecomunicacoes, Rio De Janeiro, Brazil
机构:
Samsung Adv Inst Technol, Elect Mat Lab, Mat Sector, Suwon 440600, South KoreaSamsung Adv Inst Technol, Elect Mat Lab, Mat Sector, Suwon 440600, South Korea
Sok, J
Lee, JS
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Samsung Adv Inst Technol, Elect Mat Lab, Mat Sector, Suwon 440600, South KoreaSamsung Adv Inst Technol, Elect Mat Lab, Mat Sector, Suwon 440600, South Korea
Lee, JS
Lee, EH
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Samsung Adv Inst Technol, Elect Mat Lab, Mat Sector, Suwon 440600, South KoreaSamsung Adv Inst Technol, Elect Mat Lab, Mat Sector, Suwon 440600, South Korea