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Asymmetric dielectric breakdown behavior in MgO based magnetic tunnel junctions
被引:6
作者:
Lim, J. H.
[1
,2
]
Raghavan, N.
[1
]
Mei, S.
[1
]
Lee, K. H.
[2
]
Noh, S. M.
[2
]
Kwon, J. H.
[2
]
Quek, E.
[2
]
Pey, Ic. L.
[1
]
机构:
[1] SUTD, Engn Prod Dev Pillar, Singapore 487372, Singapore
[2] GLOBALFOUNDRIES Singapore Pte Ltd, Singapore 738406, Singapore
关键词:
Clustering model;
Magnetic tunnel junctions;
MgO;
Pulsed voltage endurance;
Time-dependent dielectric breakdown;
D O I:
10.1016/j.mee.2017.05.033
中图分类号:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号:
0808 ;
0809 ;
摘要:
The time-dependent dielectric breakdown phenomenon (TDDB) has been investigated in a series of nominally identical MgO based magnetic tunnel junctions (MTJs) by pulsed voltage endurance test. Results from the pulsed endurance test reveal that the breakdown voltage is dependent on the polarity of the applied voltage. MTJs with "UP" current stress (I-up) (flowing from reference layer (RL) to free layer (FL)) show higher endurance than that of MTJs with "DOWN" current stress (I-down). We also found that bipolar stressing could result in reduced cumulative stress time before failure as compared to unipolar stressing. This could be explained by increased charge trapping/detrapping effects during bipolar stressing. The asymmetric breakdown behavior for different polarity was further supported by the different field acceleration slopes observed in the mean time to failure (MTTF) voltage bias trend line. Symmetric pulse scheme breakdown measurements were also carried out at different temperatures ranging from 25-85 degrees C. The time-dependent clustering model is applied here to best describe the breakdown statistics in view of the non-uniformity in percolation breakdown due to thickness variations (interface roughness) and other process-induced damages to the ultra-thin MgO barrier layer. (C) 2017 Elsevier B.V. All rights reserved.
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页码:308 / 312
页数:5
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