Mechanisms of focusing in sputtering: Molecular dynamics computer simulation study

被引：0
|
作者：
Samoilov, VN [1 ]
Korsakova, OS [1 ]
Rodionova, EL [1 ]
Nikitin, AM [1 ]
Bachurin, VI [1 ]
机构：
[1] MOSCOW MV LOMONOSOV STATE UNIV,DEPT PHYS,MOSCOW 117234,RUSSIA
来源：
ION BEAM MODIFICATION OF MATERIALS | 1996年
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D O I：
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中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
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页码：710 / 714
页数：5
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