Impact of Schottky junctions in the transformation of switching modes in amorphous Y2O3-based memristive system

被引:28
作者
Das, Mangal [1 ]
Kumar, Amitesh [1 ]
Mandal, Biswajit [1 ]
Myo Than Htay [2 ]
Mukherjee, Shaibal [1 ]
机构
[1] Indian Inst Technol Indore, Elect Engn, HNRG, Simrol 453552, Madhya Pradesh, India
[2] Shinshu Univ, Dept Elect & Comp Engn, Hashimoto Myo Lab, 4-17-1 Wakasato, Nagano, Nagano 3808553, Japan
关键词
DIBS; memristor; Y2O3; Schottky; RANDOM-ACCESS MEMORY; YTTRIUM-OXIDE; THIN-FILMS; SILICON; DEVICES; DIODE; LAYER; Y2O3; SI;
D O I
10.1088/1361-6463/aacf14
中图分类号
O59 [应用物理学];
学科分类号
摘要
In this report, we study factors that dominate the mode transformation of resistive switching (RS) in yttria based memristive devices. It is found that amorphous yttria films are more suitable for RS whereas highly crystalline films are counterproductive for RS. The transformation from unipolar to bipolar resistive switching mode is demonstrated in our devices via moving from a system of single Schottky barrier diode (SBD) to double SBD. The conduction mechanism behind these transformation mechanisms is found to be predominantly interfacial. We also report a forming-free Al/Y2O3/Al based memristor fabricated by the dual ion beam sputtering without any post-processing steps for the first time. It shows stable switching behavior for >29000 cycles with good retention (10(5) s) characteristics.
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页数:10
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