Properties of boron nitride (BxNy) films produced by the spin-coating process of polyborazine

被引:0
|
作者
Kho, JG [1 ]
Moon, KT [1 ]
Kim, JH [1 ]
Kim, DP [1 ]
机构
[1] Chungnam Natl Univ, Dept Ind Chem, Taejon 305764, South Korea
关键词
D O I
10.1111/j.1151-2916.2000.tb01615.x
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Boron-rich boron nitride (BN) films have been prepared on Si and SiO2/Si substrates by the vacuum pyrolysis of spin-coated polyborazine films. physical properties of the prepared films such as film strength, thermal conductivity, and dielectrics were determined. The BN films vacuum-pyrolyzed at 900 degreesC showed residual N-H bonds with a 0.75 N/B ratio, interdiffusion phenomena, and preferred orientation at the interfacial zone. Hardness and the elastic modulus of the film increased to 1.6 GPa and 50 GPa by nanoindentation loading. It had a thermal conductivity of 134 W/(m.K) at 296.5 K, and a dielectric constant in the range of 5-7, with tan partial derivative between 0.01 and 0.47, depending on the film thickness.
引用
收藏
页码:2681 / 2683
页数:3
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