Effects of preparation conditions on the optical properties of niobium oxide thin films

被引:4
作者
Ahmad, Imtiaz [1 ]
Ashraf, Muhammad [2 ]
Khan, Yaqoob [3 ]
Khawaja, Ehsan E. [1 ]
Ali, Zulfiqar [2 ]
Abbas, Turab Ali [4 ]
Waheed, Abdul [5 ]
Akhtar, S. M. J. [3 ]
机构
[1] Univ Management & Technol, Sch Sci, Dept Phys, Lahore, Pakistan
[2] Opt Labs, Islamabad, Pakistan
[3] Natl Ctr Phys, Nanosci & Technol Dept, QAU Campus, Islamabad 45320, Pakistan
[4] Natl Ctr Phys, Dept Expt Phys, QAU Campus, Islamabad, Pakistan
[5] Islamia Coll, Dept Phys, Peshawar, Pakistan
关键词
Optical properties; large bandgap material; niobium oxide; thin films; NB2O5; CONSTANTS; THICKNESS;
D O I
10.1080/24701556.2019.1661462
中图分类号
O61 [无机化学];
学科分类号
070301 ; 081704 ;
摘要
Major deposition parameters, including oxygen partial pressure and substrate temperature maintained during film deposition, affect the optical properties of electron beam evaporated niobium oxide films. All the films deposited were found to be amorphous as revealed by the X-ray diffraction study. A method requiring measurements at normal incidence of transmission from two films of different thicknesses prepared under identical conditions was used to determine the optical constants. Substantial changes in the optical constants and optical bandgap energy were observed following changes in the preparation conditions. These variations are related to the corresponding compositional changes, as observed by Rutherford Backscattering Spectroscopy, in the atomic ratio of oxygen to niobium in the films prepared under different conditions.
引用
收藏
页码:22 / 27
页数:6
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