Fabrication of parabolic nanofocusing x-ray lenses

被引：3

作者：

Kurapova, O ^{[1
]}

Feste, S ^{[1
]}

Gather, M ^{[1
]}

Günzler, TF ^{[1
]}

Hunger, T ^{[1
]}

Kuhlmann, M ^{[1
]}

Patommel, J ^{[1
]}

Schroer, CG ^{[1
]}

Lengeler, B ^{[1
]}

van der Hart, A ^{[1
]}

机构：

[1] Univ Aachen, Inst Phys 2, D-52056 Aachen, Germany

来源：

DESIGN AND MICROFABRICATION OF NOVEL X-RAY OPTICS II | 2004年 / 5539卷

关键词：

refractive lenses; e-beam lithography; reactive ion etching; microfabrication; x-ray optics;

D O I：

10.1117/12.563921

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We have fabricated planar parabolic lenses made of silicon and boron which have a focal distance in the range of a few millimetres at hard x-ray energies. Two silicon lenses were used in a crossed geometry to generate a microbeam with a lateral size of 160x107 nm(2) at 15 keV. The focus size of 180 nm at 22 keV and at a distance from the synchrotron radiation source of 42 m was obtained with boron lens. The performance of the silicon lenses was improved by optimising the e-beam lithography and the etching parameters. In addition, we report on the microfabrication process of diamond as well as pyrolytic graphite lenses.

引用

页码：38 / 47

页数：10

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