Engineering Oxygen Migration for Homogeneous Volume Resistive Switching in 3-Terminal Devices

被引:19
作者
Carlos Gonzalez-Rosillo, Juan [1 ,2 ]
Ortega-Hernandez, Rafael [1 ]
Arndt, Benedikt [3 ]
Coll, Mariona [1 ]
Dittmann, Regina [3 ]
Obradors, Xavier [1 ]
Palau, Anna [1 ]
Sune, Jordi [2 ]
Puig, Teresa [1 ]
机构
[1] CSIC, Inst Ciencia Mat Barcelona ICMAB, Campus Bellaterra, Barcelona 08193, Spain
[2] Univ Autonoma Barcelona, Dept Engn Electrbn, E-08193 Barcelona, Spain
[3] Res Ctr Julich, Peter Grunberg Inst 7, Wilhelm Johnen Str, D-52425 Julich, Germany
关键词
nanoelectronics; oxygen exchange; resistive switching; strongly correlated systems; THIN-FILMS; OXIDES; VACANCIES; DENSITY;
D O I
10.1002/aelm.201800629
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Resistive switching effects are in a superb position to tackle the challenges for the near future of nanoelectronics and neuromorphics. Material-wise, the outstanding properties of strongly correlated metallic perovskite oxides, in particular, those displaying metal-insulator transition can be exploited for a new generation of devices based on a volume resistive switching (VRS) phenomenon beyond filamentary and interface ideas. This study reports a full description of this new and robust physical mechanism governing VRS memory effects in mixed-valence mixed-conductor metallic La1-xSrxMnO3-y perovskites by identifying the role and rate limiting steps of oxygen exchange through oxygen partial pressure experiments. It is demonstrated that oxygen migration can be smartly engineered by introducing a CeO2-x capping layer, which is further used to validate the VRS phenomenon by operating a nonvolatile and volumetric proof-of-concept gate-controlled three-terminal conductive bridge device.
引用
收藏
页数:8
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