Change of the properties of nanostructured MoO3 thin films using gamma-ray irradiation

被引:79
作者
Chandoul, F. [1 ,3 ]
Boukhachem, A. [2 ]
Hosni, F. [3 ]
Moussa, H. [4 ]
Fayache, M. S. [1 ,3 ]
Amlouk, M. [2 ]
Schneider, R. [4 ]
机构
[1] Univ Tunis El Manar, Fac Math Phys & Nat Sci Tunis, Tunis 2092, Tunisia
[2] Fac Sci Tunis, Res Unit Phys Semicond Devices UPDS, Tunis 2092, Tunisia
[3] CNSTN, Lab Energy & Matter Nucl Sci Dev, Sidi Thabet 2020, Tunisia
[4] Univ Lorraine, Lab React & Genie Proc, CNRS, UMR 7274, 1 Rue Grandville,BP 20451, F-54001 Nancy, France
关键词
MoO3; oxide; Thin film deposition; Spray pyrolysis; Gamma irradiation; OPTICAL-PROPERTIES; ALPHA-MOO3; CO; TRANSPARENT; PHOTOLUMINESCENCE; TEMPERATURE; SENSITIVITY; RADIATION; H-MOO3; GLASS;
D O I
10.1016/j.ceramint.2018.04.040
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Thin films of Molybdenum trioxide (MoO3) were deposited on glass substrates by the spray pyrolysis at 500 degrees C and the samples were then exposed to gamma gamma radiation doses by Co-60 radioisotope at different doses (0.1, 10 and 50 kGy). The effects of gamma irradiation on the properties of MoO3 thin films were investigated. The XRD pattern and Raman spectroscopy of as-deposited MoO3 samples show an orthorhombic structure related to alpha-MoO3 with (0k0) preferred orientations. Uv-vis spectra were studied to investigate the transmission measurements of MoO3 films. The optical energy band gap and Urbach energy were found to be gamma-dose dependent. Photoluminescence measurements at room temperature using 300 nm wavelength excitation were investigated. SEM images indicate the formation of alpha-MoO3 nanorods.
引用
收藏
页码:12483 / 12490
页数:8
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