Epitaxial magnetic Fe layers grown on Si(001) by means of a template method

被引:20
作者
Bertoncini, P
Berling, D
Wetzel, P
Mehdaoui, A
Loegel, B
Gewinner, G
Ulhaq-Bouillet, C
Pierron-Bohnes, V
机构
[1] LPSE UPRES A CNRS 7014, F-68093 Mulhouse, France
[2] IPCMS GEMM, F-67037 Strasbourg, France
关键词
iron; magnetic measurements; metal-semiconductor magnetic thin film structures; molecular beam epitaxy; silicides; silicon; single crystal epitaxy; transmission high-energy electron diffraction;
D O I
10.1016/S0039-6028(00)00180-1
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We demonstrate the possibility of growing good-quality epitaxial Fe films on a Si(001) substrate, opening up new prospects to prepare ferromagnetic superlattices on this substrate. A template technique prevents the formation of disordered interfacial iron silicides. Transmission electron microscopy reveals that the Fe layers are fairly uniform in thickness with abrupt interfaces and in majority epitaxial relationship Fe(001)[100]//Si(001)[100]. Both the diffraction data and the observation of Moire fringes indicate that the Fe lattice is almost relaxed towards its bulk bcc phase in thick layers [greater than or equal to 40 monolayers (ML)] but is still strained by the substrate in the thinnest films. Magneto-optical Kerr effect measurements show that the films evaporated at normal incidence with a thickness above 4 ML are ferromagnetic at room temperature and exhibit in-plane biaxial anisotropy. (C) 2000 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:755 / 760
页数:6
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