Microstructure and fractal growth mechanism of sputtered films of Bi2Sr2Ca1Cu2O7-x on Si substrates

被引：0

作者：

Qian, WS ^{[1
]}

Liu, R ^{[1
]}

Wei, TL ^{[1
]}

机构：

[1] Southeast Univ, Ctr Microelect, Nanjing 210096, Peoples R China

来源：

THIRD INTERNATIONAL CONFERENCE ON THIN FILM PHYSICS AND APPLICATIONS | 1998年 / 3175卷

关键词：

spiral growth; Bi2Sr2Ca1Cu2O7-x; superconducting Films; YSZ/Si; substrates; sputtering; Fractal; diffusion; nucleation;

D O I：

10.1117/12.300695

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Bi2Sr2Ca1Cu2O7-x(BSCCO) superconducting films were deposited on Si substrates with buffer layers of Y-stabilized ZrO2 films(YSZ) by magnetic sputtering. The critical temperature (Tc) of BSCCO film on YSZ/Si was 82K. The microstructure of BSCCO/YSZ/Si was studied by Scanning Electronic Microscope (SEM) and Atom Force Microscope(AFM), the growing model of spiral nucleation was verified. Fractal images were found in the micrographs, and their growth mechanism was presented.

引用

页码：322 / 327

页数：6