Spin-on-glass (SOG) for the trilayer imaging process

被引：3

作者：

Sugita, H ^{[1
]}

Saito, A ^{[1
]}

Konno, K ^{[1
]}

Hayasui, A ^{[1
]}

Nishiyama, S ^{[1
]}

Ebisawa, M ^{[1
]}

Nishikawa, M ^{[1
]}

Ohta, Y ^{[1
]}

Tominaga, T ^{[1
]}

机构：

[1] JSR Corp, Fine Elect Res Lab, Yokaichi, Mie 5108552, Japan

来源：

JOURNAL OF APPLIED POLYMER SCIENCE | 2003年 / 88卷 / 03期

关键词：

spin-on-glass; sol-gel; trilayer imaging process; lithography;

D O I：

10.1002/app.11582

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

Maleic acid catalyzed hydrolysis and condensation of tetramethoxysilane was carried out in 1-propoxy-2-propanol to prepare a spin-on-glass (SOG) material for the trilayer imaging process. The material was found to be stable enough for industry use. Minor amounts of methylsilsesquioxane and photoacid generators were introduced into the material. Thin resist (top layer) patterns were imaged on the SOG film (intermediate layer), which was coated on a hard-baked i-line resist (bottom layer). The SOG film showed sufficient adhesion to the resist patterns, and superior resist profiles were imaged on the film. (C) 2003 Wiley Periodicals, Inc.

引用

页码：636 / 640

页数：5

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