RF sputtering of polymers and its potential application

Plasma polymerization processes are commonly used for the deposition of thin films of plasma polymers that have been proposed for a variety of applications ranging from surface modifications for biomedical purposes to optical coatings and variable and protective films in electronics. RF sputtering of polymeric materials in an inert gas (Ar) or in its own fragmented polymer vapours can be applied in order to avoid the conventional supply of gaseous monomer. Volatile fragments of polymeric target serve as plasma polymerization precursors in the case of RF sputtering. RF sputtering of polytetrafluoroethylene (PTFE), polyimide (PI), etc. are reviewed. Recent results from our laboratory on balanced and unbalanced magnetron RF sputtering of polytetrafluoroethylene and polyethylene (PE) are presented. The dependence of structure and morphology Of RF sputtered plasma polymers on plasma parameters and substrate temperature is discussed. In conclusion potential applications are summarized. (C) 2000 Elsevier Science Ltd. All rights reserved.