MOCVD growth of MgSe thin films on GaAs substrates

被引:18
作者
Jiang, FY [1 ]
Liao, QH [1 ]
Fan, GH [1 ]
Xiong, CB [1 ]
Peng, XX [1 ]
Pan, CK [1 ]
Liu, NH [1 ]
机构
[1] Nanchang Univ, Inst Mat Sci, Nanchang 330047, Peoples R China
基金
中国国家自然科学基金;
关键词
MgSe; zincblende; MOCVD;
D O I
10.1016/S0022-0248(97)00426-0
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
MgSe thin films have been grown by metal-organic chemical vapor deposition on GaAs substrates. Our experimental results show that the crystal structure of MgSe depends strongly on both the growth temperature and the substrate orientation. Using the X-ray diffraction technique, we observed the three phases of MgSe; the rock salt, wurtzite and zincblende structures. The lattice constant of zincblende MgSe was determined to be 5.96 Angstrom. (C) 1998 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:289 / 293
页数:5
相关论文
共 50 条
[41]   MOCVD of InGaAsP, InGaAs and InGaP over InP and GaAs substrates:: distribution of composition and growth rate in a horizontal reactor [J].
Féron, O ;
Sugiyama, M ;
Asawamethapant, W ;
Futakuchi, N ;
Feurprier, Y ;
Nakano, Y ;
Shimogaki, Y .
APPLIED SURFACE SCIENCE, 2000, 159 :318-327
[42]   Deposition of Au Thin Films and Nanoparticles by MOCVD [J].
Parkhomenko, Roman G. ;
Morozova, Natalia B. ;
Zharkova, Galina I. ;
Shubin, Yuri V. ;
Trubin, Sergey V. ;
Kriventsov, Vladimir V. ;
Kuchumov, Boris M. ;
Koretskaya, Tatiana P. ;
Igumenov, Igor K. .
CHEMICAL VAPOR DEPOSITION, 2012, 18 (10-12) :336-342
[43]   Recent developments on MOCVD of ferroelectric thin films [J].
Otani, Y ;
Okamura, S ;
Shiosaki, T .
JOURNAL OF ELECTROCERAMICS, 2004, 13 (1-3) :15-22
[44]   MOCVD Growth of Compositionally Graded BaxSr1-xTiO3 Thin Films [J].
Sbrockey, N. M. ;
Cole, M. W. ;
Kalkur, T. S. ;
Luong, M. ;
Spanier, J. E. ;
Tompa, G. S. .
INTEGRATED FERROELECTRICS, 2011, 126 :21-27
[45]   Effects of processing parameters in the MOCVD growth of nanostructured lanthanum trifluoride and oxyfluoride thin films [J].
Malandrino, Graziella ;
Perdicaro, Laura M. S. ;
Fragala, Ignazio L. .
CHEMICAL VAPOR DEPOSITION, 2006, 12 (12) :736-741
[46]   Effect of growth parameters on TiO2 thin films deposited using MOCVD [J].
Nami, Z ;
Misman, O ;
Erbil, A ;
May, GS .
JOURNAL OF CRYSTAL GROWTH, 1997, 179 (3-4) :522-538
[47]   Novel precursors for the MOCVD of ferroelectric thin films [J].
Leedham, TJ ;
Jones, AC ;
Wright, PJ ;
Crosbie, MJ ;
Williams, DJ ;
Davies, HO ;
O'Brien, P .
INTEGRATED FERROELECTRICS, 1999, 26 (1-4) :787-794
[48]   Preparation of iron oxide thin films by MOCVD [J].
Ueyama, R ;
Kuribayashi, K ;
Itoh, N .
JOURNAL OF THE CERAMIC SOCIETY OF JAPAN, 1996, 104 (10) :949-952
[49]   MOCVD GROWTH OF ALGAAS/GAAS STRUCTURES ON NONPLANAR (111) SUBSTRATES - EVIDENCE FOR LATERAL GAS-PHASE DIFFUSION [J].
DZURKO, KM ;
HUMMELL, SG ;
MENU, EP ;
DAPKUS, PD .
JOURNAL OF ELECTRONIC MATERIALS, 1990, 19 (12) :1367-1372
[50]   Domain structures of MOCVD cobalt thin films [J].
Chioncel, M. F. ;
Nagaraja, H. S. ;
Rossignol, F. ;
Haycock, P. W. .
JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS, 2007, 313 (01) :135-141