Development of the Hard-X-ray Angle Resolved X-ray Photoemission Spectrometer for Laboratory Use

被引：35

作者：

Kobata, Masaaki ^{[1
]}

Pis, Igor ^{[1
,2
]}

Iwai, Hideo ^{[3
]}

Yamazui, Hiromichi ^{[4
]}

Takahashi, Hiroaki ^{[4
]}

Suzuki, Mineharu ^{[4
]}

Matsuda, Hiroyuki ^{[5
]}

Daimon, Hiroshi ^{[5
]}

Kobayashi, Keisuke ^{[1
]}

机构：

[1] SPring 8 BL15XU, Natl Inst Mat Sci, Sayo, Hyogo 6795148, Japan

[2] Charles Univ Prague, Fac Math & Phys, Dept Surface & Plasma Sci, CR-18000 Prague 8, Czech Republic

[3] Natl Inst Mat Sci, Tsukuba, Ibaraki 3050047, Japan

[4] ULVAC PHI Inc, Kanagawa 2538522, Japan

[5] Nara Inst Sci & Technol, Grad Sch Mat Sci, Nara 6300192, Japan

来源：

ANALYTICAL SCIENCES | 2010年 / 26卷 / 02期

关键词：

PHOTOELECTRON-SPECTROSCOPY; DIFFRACTION;

D O I：

10.2116/analsci.26.227

中图分类号：

O65 [分析化学];

学科分类号：

070302 ; 081704 ;

摘要：

This article reports development of a practical laboratory hard X-ray photoelectron spectroscopy (HXPS) system by combining a focused monochromatic Cr K-alpha X-ray source, a wide angle acceptance objective lens and a high kinetic energy electron analyzer. The Cr K-alpha source consists of a Cr target, a 15 kV focused electron gun, and a compact bent crystal monochromator. The X-ray spot size is variable from 10 mu m (1.25 W) to 200 mu m (50 W). A wide acceptance angle objective lens is installed in front of a hemispherical analyzer. The total resolution of 0.53 eV was obtained by Au Fermi-edge measurements. Angle acceptance of +/- 35 degrees with angle resolution of 0.5 degrees was achieved by measuring Au 3d(5/2) peak through a hemicylinder multi-Slit on an Au thin strip, in angle resolution mode. As the examples, silicon based multilayer thin films were used for showing the possibilities of deeper (larger) detection depth with the designed system.

引用

页码：227 / 232

页数：6

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