DC and RF Performance Analysis of AlGaN/GaN based HEMT

被引:0
|
作者
De, Tanmoy [1 ]
Mohapatra, Meryleen [1 ]
Panda, A. K. [2 ]
机构
[1] Siksha O Anusandhan Univ, ECE Dept, ITER, Bhubaneswar, Orissa, India
[2] Natl Inst Sci & Technol, Elect & Commun Engn Dept, Berhampur, Odisha, India
来源
2016 2ND INTERNATIONAL CONFERENCE ON COMMUNICATION CONTROL AND INTELLIGENT SYSTEMS (CCIS) | 2016年
关键词
High Electron Mobility Transistor; Transconductance; Microwave; Cut off Frequency; MICROWAVE NOISE PERFORMANCE; FIELD-EFFECT TRANSISTORS;
D O I
暂无
中图分类号
TP [自动化技术、计算机技术];
学科分类号
0812 ;
摘要
In this work, a AlGaN/GaN based High Electron Mobility Transistor with 3 mu m gate length is designed and simulated with the Silvaco TCAD software which is passivated by SiO2. A drain current of 658 mA/mm is found for a gate voltage of 2.5 V. The transconductance of the device is 123 mS/mm at the gate voltage of 2V. A maximum output conductance of 163 mS/mm is obtained at the drain voltage of 45 V. The gate to source and gate to drain capacitance is calculated for the device. The cutoff frequency of the device is 2.6 GHz and the maximum frequency oscillation of the device is 9.8 GHz. A minimum noise figure of 11.6 dB is obtained at the operating frequency 5 GHz. Intrinsic time delay of the device is 122 ps. These properties prove that the AlGaN/GaN based HEMT is perfect for high power applications as well as microwave applications.
引用
收藏
页码:181 / 184
页数:4
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