Basic characteristics of Ar/N2 atmospheric pressure nonequilibrium microwave discharge plasma jets

被引:10
作者
Yuji, Toshifumi
Fujioka, Kazunari
Fujii, Shuitsu
Akatsuka, Hiroshi
机构
[1] Oita Natl Coll Technol, Dept Elect & Elect Engn, Oita 8700152, Japan
[2] Hiroshima Coll Maritime Technol, Hiroshima 7250231, Japan
[3] Tokyo Inst Technol, Meguro Ku, Tokyo 1528550, Japan
[4] ADTEC Plasma Technol Co Ltd, Fukuyama, Hiroshima 7250231, Japan
关键词
vibrational temperature; rotational temperature; microwave discharge plasma jet; optical emission spectroscopy; PET film;
D O I
10.1002/tee.20193
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
To understand the mechanism of surface processing by atmospheric pressure nonequilibrium microwave discharge plasma jets of coaxial type without a resonator, we measured the vibrational and rotational temperatures in plasmas using optical emission spectroscopy. The plasma was excited by a microwave power supply, using a gas mixture of Ar and N-2 as the plasma gas, and changing the flow rate of N2 gas. We also measured the change in the contact angle of a PET film before and after the plasma processing. It decreased as the plasma rotational temperature increased, indicating that the hydrophilicity of the PET surface was improved as the plasma rotational temperature became higher. (c) 2007 Institute of Electrical Engineers of Japan. Published by John Wiley & Sons, Inc.
引用
收藏
页码:473 / 475
页数:3
相关论文
共 5 条
  • [1] Capitelli M., 2000, SPRINGER SERIES ATOM
  • [2] Hrachová V, 2002, ADV PLASMA PHYS RES, V3, P33
  • [3] Spectroscopic study on vibrational distribution of N2C3Π and B3Π states in microwave nitrogen discharge
    Sakamoto, Takeshi
    Matsuura, Haruaki
    Akatsuka, Hiroshi
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2006, 45 (10A): : 7905 - 7910
  • [4] The atmospheric-pressure plasma jet:: A review and comparison to other plasma sources
    Schütze, A
    Jeong, JY
    Babayan, SE
    Park, J
    Selwyn, GS
    Hicks, RF
    [J]. IEEE TRANSACTIONS ON PLASMA SCIENCE, 1998, 26 (06) : 1685 - 1694
  • [5] Takaki K., 2003, J PLASMA FUSION RES, V79, P1002