An enhancement in the wettability and wear resistance of titanium dioxide (TiO2) thin films was obtained by combining a polydopamine (PDA) adhesive layer between TiO2 layer and glass substrate. The coating layers of TiO2 thin film, prepared from sol-gel precursor, were deposited on PDA precoated glass substrate by sol-gel dip coating technique. The wettability of films was evaluated by testing the water contact angle and adhesion force between an atomic force microscope (AFM) tip and film surface. The results indicate that the hybrid TiO2/PDA thin films, compared to pure TiO2 thin films, exhibit higher wettability. UV-visible absorption spectra showed the wider absorption range in TiO2/PDA thin films, which means more oxygen vacancies may be induced by light irradiation and are favorable for the absorption of water molecules, thus enhancing the hydrophilicity of the films. The wear resistance and indentation tests were performed by scratching the film surface with the AFM probe and a NHT nanoindentor, respectively, indicating that the hybrid TiO2/PDA thin films have more wear resistance than the pure TiO2 thin films, due to the formation of a mixed layer consisting of TiO2 and PDA that increases the adhesive force of TiO2 layer to the substrate.
机构:
E China Normal Univ, Minist Educ, Key Lab Polar Mat & Devices, Shanghai 200241, Peoples R China
Henan Univ, Sch Phys & Elect, Kaifeng 475004, Peoples R ChinaE China Normal Univ, Minist Educ, Key Lab Polar Mat & Devices, Shanghai 200241, Peoples R China
Tian, Jianjun
Deng, Hongmei
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Shanghai Univ, Lab Microstruct, Shanghai 200444, Peoples R ChinaE China Normal Univ, Minist Educ, Key Lab Polar Mat & Devices, Shanghai 200241, Peoples R China
Deng, Hongmei
Sun, Lin
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E China Normal Univ, Minist Educ, Key Lab Polar Mat & Devices, Shanghai 200241, Peoples R ChinaE China Normal Univ, Minist Educ, Key Lab Polar Mat & Devices, Shanghai 200241, Peoples R China
Sun, Lin
Kong, Hui
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E China Normal Univ, Minist Educ, Key Lab Polar Mat & Devices, Shanghai 200241, Peoples R ChinaE China Normal Univ, Minist Educ, Key Lab Polar Mat & Devices, Shanghai 200241, Peoples R China
Kong, Hui
Yang, Pingxiong
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E China Normal Univ, Minist Educ, Key Lab Polar Mat & Devices, Shanghai 200241, Peoples R ChinaE China Normal Univ, Minist Educ, Key Lab Polar Mat & Devices, Shanghai 200241, Peoples R China
Yang, Pingxiong
Chu, Junhao
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E China Normal Univ, Minist Educ, Key Lab Polar Mat & Devices, Shanghai 200241, Peoples R ChinaE China Normal Univ, Minist Educ, Key Lab Polar Mat & Devices, Shanghai 200241, Peoples R China
机构:
Univ Constantine, Ceram Lab, 1 Route Ain El Bey, Constantine 25000, AlgeriaUniv Constantine, Ceram Lab, 1 Route Ain El Bey, Constantine 25000, Algeria
Abbas, F.
Bensaha, R.
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Univ Constantine, Ceram Lab, 1 Route Ain El Bey, Constantine 25000, AlgeriaUniv Constantine, Ceram Lab, 1 Route Ain El Bey, Constantine 25000, Algeria
Bensaha, R.
Tarore, H.
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Univ Wisconsin Whitewater, Dept Chem, Whitewater, WI USAUniv Constantine, Ceram Lab, 1 Route Ain El Bey, Constantine 25000, Algeria
机构:
Mar Ivanios Coll, Post Grad & Res Dept Phys, Thin Film Lab, Thiruvananthapuram 695015, Kerala, IndiaMar Ivanios Coll, Post Grad & Res Dept Phys, Thin Film Lab, Thiruvananthapuram 695015, Kerala, India
Anitha, V. S.
Lekshmy, S. Sujatha
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NSS Coll Pandalam, Dept Phys, Pathanamthitta 689501, IndiaMar Ivanios Coll, Post Grad & Res Dept Phys, Thin Film Lab, Thiruvananthapuram 695015, Kerala, India
Lekshmy, S. Sujatha
Joy, K.
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Mar Ivanios Coll, Post Grad & Res Dept Phys, Thin Film Lab, Thiruvananthapuram 695015, Kerala, India
Heera Coll Engn & Technol, Dept Phys, Thiruvananthapuram 695568, Kerala, IndiaMar Ivanios Coll, Post Grad & Res Dept Phys, Thin Film Lab, Thiruvananthapuram 695015, Kerala, India