Demonstration of long-pulse power amplification at 1 GHz using 4H-SiC RF BJTs on a conductive substrate

被引:4
作者
Zhao, Feng [1 ]
Van Zeghbroeck, Bart
Torvik, Kris
Shi, Tiefeng
Mallinger, Mike
机构
[1] Microsemi Corp, Power Prod Grp, Boulder, CO 80301 USA
[2] Univ Colorado, Dept Elect & Comp Engn, Boulder, CO 80309 USA
[3] Microsemi Corp, Power Prod Grp, Santa Clara, CA 95051 USA
关键词
bipolar junction transistors (BJTs); conductive substrate; L-band; long pulse; output power; power-added efficiency (PAE); power gain; radar; radio frequency (RF); 4H-SiC;
D O I
10.1109/LED.2007.895386
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this letter, we report 4H-SiC RF bipolar junction transistors (BJTs) on an n-type 4H-SiC conductive substrate with, for the first time, RF power amplification at 1 GHz. The devices were fabricated using a double-mesa etch and interdigitated emitter-base finger design. When tested under common-base and pulsed Class AB mode at 1 GHz, the packaged devices with external matching exhibited a 10.1-dB power gain and a 22.9-W output power, with a 40.8% power-added efficiency (PAE) at 1-ms pulsewidth and 10% duty cycle. The RF power density is 313.8 W/cm(2), normalized to the total emitter finger area. At a longer pulsewidth of 6 ms and the same duty cycle of 10%, devices can still deliver a 16.2-W (222.2 W/cm(2)) output power, with 10-dB gain and 28.3% PAE. The RF performance combined with the lower cost SiC conductive substrate, as compared to the semi-insulating substrate, makes these devices promising for use in power amplifiers for long-pulse L-band radar applications.
引用
收藏
页码:398 / 400
页数:3
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