Photochemical Properties of Free Chlorine and Inorganic Chloramines at 185 nm for VUV/UV/Chlorine Advanced Oxidation

被引:9
|
作者
Masjoudi, Mahsa [1 ]
Mohseni, Madjid [1 ]
机构
[1] Univ British Columbia, Dept Chem & Biol Engn, Vancouver, BC V6T 1Z3, Canada
来源
ACS ES&T WATER | 2022年 / 2卷 / 05期
基金
加拿大自然科学与工程研究理事会;
关键词
potable reuse; free chlorine; chloramine; hydroxyl radical; chlorine radical; AQUEOUS-SOLUTION; TEMPERATURE-DEPENDENCE; RADIATION-CHEMISTRY; OXYCHLORINE IONS; PART; DEGRADATION; UV; PHOTOLYSIS; WATER; UV/CHLORINE;
D O I
10.1021/acsestwater.1c00468
中图分类号
X [环境科学、安全科学];
学科分类号
08 ; 0830 ;
摘要
Vacuum-UV (VUV) irradiation is a potentially viable advanced oxidation process (AOP) for water treatment and potable reuse applications due to high generation of hydroxyl radicals. Under potable reuse conditions, free chlorine and inorganic chloramines are present in the AOP feed water and could possibly participate in the photochemical reactions. The focus of this study is to determine the photochemical parameters of these species at 185 nm, which are necessary for accurate kinetic modeling of the VUV process. The measured molar absorption coefficients at 185 nm for both free chlorine and chloramines are significantly higher than the values reported at 254 nm, implying that high concentrations of these oxidants could act as an inner filter to the VUV photons. Furthermore, kinetic modeling of the process showed that both hypochlorous acid and hypochlorite ion can undergo direct photolysis at 185 nm with quantum yields of 0.7 and 0.1 mol/einstein, respectively, while the direct photolysis of chloramines at this wavelength is negligible. Overall, water is the major absorber of 185 nm photons in the VUV AOP and addition of free chlorine enhances radical generation in the system. Also, low concentration of chloramines relevant to potable reuse only slightly decreases the treatment efficiency through shielding and radical scavenging reactions.
引用
收藏
页码:769 / 777
页数:9
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