High-temperature oxidation of Mo-rich (Mo1-xNbx)Si2 pseudo-binary compounds

被引：11

作者：

Zhang, L. T. ^{[1
]}

Zhu, O. ^{[1
]}

Zhang, F. ^{[1
]}

Shan, A. D. ^{[1
]}

Wu, J. S. ^{[1
]}

机构：

[1] Shanghai Jiao Tong Univ, Sch Mat Sci & Engn, Key Lab Minist Educ High Temperature Mat & Testin, Shanghai 200240, Peoples R China

来源：

SCRIPTA MATERIALIA | 2007年 / 57卷 / 04期

基金：

中国国家自然科学基金;

关键词：

oxidation; silicide; MoSi2; NbSi2;

D O I：

10.1016/j.scriptamat.2007.04.039

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The oxidation behaviours of arc-melted (Mo1-xNb1-x)Si-2 pseudo-binary alloys were investigated at temperatures between 1473 and 1773 K with emphasis on the Mo-rich portion. C11b/C40 duplex-phase microstructure was formed in the composition range of x = 0.05-0.2. In Mo-rich alloys (x <= 0.5), the near-parabolic law of oxidation kinetics was followed at all investigated temperatures. The oxidation resistance of alloys depends on chemical composition as well as microstructure. An anomalous increase in weight gain was observed in the C11b/C40 two-phase region, where the peak weight gain shifts to the Mo-rich side with an increase in temperature. The C40 single phase (Mo0.7Nb0.3)Si-2 was found to have a low oxidation weight gain which is even less than that of the binary MOSi2. However, when the Nb content x exceeds 0.4, the oxidation resistance becomes poor and Nb2O5 is formed in the oxide scale. (c) 2007 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.

引用

页码：305 / 308

页数：4

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