Interaction of oxygen with TiN(001):N⇆O exchange and oxidation process

被引:57
作者
Graciani, J. [1 ]
Sanz, J. Fdez
Asaki, T.
Nakamura, K.
Rodriguez, J. A.
机构
[1] Univ Seville, Dept Quim Fis, E-41012 Seville, Spain
[2] Tokyo Inst Technol, Mat & Struct Lab, Yokohama, Kanagawa 2268503, Japan
[3] Brookhaven Natl Lab, Dept Chem, Upton, NY 11973 USA
关键词
D O I
10.1063/1.2743418
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
This work presents a detailed experimental and theoretical study of the oxidation of TiN(001) using a combination of synchrotron-based photoemission and density functional theory (DFT). Experimentally, the adsorption of O-2 on TiN(001) was investigated at temperatures between 250 and 450 K. At the lowest temperature, there was chemisorption of oxygen (O-2,O-gas -> 2O(ads)) without significant surface oxidation. In contrast, at 450 K the amount of O-2 adsorbed increased continuously, there was no evidence for an oxygen saturation coverage, a clear signal in the Ti 2p core level spectra denoted the presence of TiOx species, and desorption of both N-2 and NO was detected. The DFT calculations show that the adsorption/dissociation of O-2 is highly exothermic on a TiN(001) substrate and is carried out mainly by the Ti centers. A high oxygen coverage (larger than 0.5 ML) may induce some structural reconstructions of the surface. The exchange of a surface N atom by an O adatom is a highly endothermic process (Delta E=2.84 eV). However, the overall oxidation of the surface layer is thermodynamically favored due to the energy released by the dissociative adsorption of O-2 and the formation of N-2 or NO. Both experimental and theoretical results lead to conclude that a TiN+mO(2)-> TiOx+NO reaction is an important exit channel for nitrogen in the oxidation process. (c) 2007 American Institute of Physics.
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页数:8
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