The influence of electric field on the photodetachment of H- near a metal surface

The influence of electric field on the photodetachment of H- near a metal surface is investigated based on the closed-orbit theory. It is found that the photodetachment of H- near a metal surface is not only related to the electric field strength but also to the electric field direction. If the electric field is along the +z axis, it can strengthen the oscillation in the photodetachment cross section. However, if the electric field is along the -z axis, since the direction of electric field force is opposite to that of static-image force caused by the metal surface, the situation becomes much more complicated. When the electric field is very weak, its influence can be neglected. The photodetachment cross section is nearly the same as that when a single metal surface exists. When the electric field strength is strong enough, the electric field force is able to counteract the metallic attraction, therefore no closed orbit is formed. If the electric field continues to increase until its influence becomes dominant, the photodetachment cross section approaches the case of the photodetachment of H- in an electric field. Our results may be useful for guiding future experimental studies on the photodetachment of negative ions near surfaces.