Ballistic transport in strained-Si cavities: experiment and theory

被引:0
|
作者
Scappucci, G [1 ]
Di Gaspare, L [1 ]
Notargiacomo, A [1 ]
Evangelisti, F [1 ]
Giovine, E [1 ]
Leoni, R [1 ]
Piazza, V [1 ]
Pingue, P [1 ]
Beltram, F [1 ]
Pala, MG [1 ]
Curatola, G [1 ]
Iannaccone, G [1 ]
机构
[1] Univ Roma Tre, Dipartimento Fis E Amaldi, Unita INFM, I-00146 Rome, Italy
来源
2004 4TH IEEE CONFERENCE ON NANOTECHNOLOGY | 2004年
关键词
ballistic transport; magnetoconductance; mesoscopic transport; strained silicon;
D O I
暂无
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
In this paper we present the observation of ballistic transport in strained silicon cavities defined by etching on a silicon germanium heterostructure, demonstrated by magnetic focusing of conductance of the cavity at T = 50 mK. Numerical simulations, based on a novel approach which allows to include an arbitrary degree of decoherence in mesoscopic transport, show that magnetoconductance features can be related to the semiclassical orbits by means of the local density of states in the cavity.
引用
收藏
页码:92 / 94
页数:3
相关论文
共 50 条
  • [11] Scaling of strained-Si n-MOSFETs into the ballistic regime and associated anisotropic effects
    Bufler, FM
    Fichtner, W
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2003, 50 (02) : 278 - 284
  • [12] Contact metallization on strained-Si
    Saha, AR
    Chattopadhyay, S
    Maiti, CK
    SOLID-STATE ELECTRONICS, 2004, 48 (08) : 1391 - 1399
  • [13] Effect of strained-Si layer thickness on dislocation distribution and SiGe relaxation in strained-Si/SiGe heterostructures
    Lu, Jinggang
    Rozgonyi, George
    Seacrist, Mike
    Chaumont, Michelle
    Campion, Alan
    JOURNAL OF APPLIED PHYSICS, 2008, 104 (07)
  • [14] Effect of strained-Si layer thickness on dislocation distribution and SiGe relaxation in strained-Si/SiGe heterostructures
    Lu, Jinggang
    Rozgonyi, George
    Seacrist, Mike
    Chaumont, Michelle
    Campion, Alan
    Journal of Applied Physics, 2008, 104 (07):
  • [15] Reliability Issues In Strained-Si MOSFETs
    Mahato, S. S.
    Saha, A. R.
    IETE JOURNAL OF RESEARCH, 2007, 53 (03) : 277 - 284
  • [16] Strained-Si/SiGe-on-insulator inversion layers:: The role of strained-Si layer thickness on electron mobility
    Gámiz, F
    Roldán, JB
    Godoy, A
    APPLIED PHYSICS LETTERS, 2002, 80 (22) : 4160 - 4162
  • [17] Fabrication of Strained-Si/Strained-Ge Heterostructures on Insulator
    Leonardo Gomez
    Michael Canonico
    Meekyung Kim
    Pouya Hashemi
    Judy L. Hoyt
    Journal of Electronic Materials, 2008, 37
  • [18] Numerical simulation of ballistic magnetoconductance and magnetic focusing in strained Si-SiGe cavities
    Pala, MG
    Iannaccone, G
    Curatola, G
    NANOTECHNOLOGY, 2005, 16 (05) : S206 - S210
  • [19] Fabrication of strained-Si/strained-Ge heterostructures on insulator
    Gomez, Leonardo
    Canonico, Michael
    Kim, Meekyung
    Hashemi, Pouya
    Hoyt, Judy L.
    JOURNAL OF ELECTRONIC MATERIALS, 2008, 37 (03) : 240 - 244
  • [20] Impact of underlap and mole-fraction on RF performance of strained-Si/Si1-xGex/strained-Si DG MOSFETs
    Dutta, Arka
    Koley, Kalyan
    Sarkar, Chandan K.
    SUPERLATTICES AND MICROSTRUCTURES, 2014, 75 : 634 - 646