High Throughput Characterization of Epitaxially Grown Single-Layer MoS2

被引:18
作者
Ghasemi, Foad [1 ,2 ]
Frisenda, Riccardo [1 ]
Dumcenco, Dumitru [3 ,4 ]
Kis, Andras [3 ,4 ]
Perez de Lara, David [1 ]
Castellanos-Gomez, Andres [1 ,5 ]
机构
[1] Inst Madrileno Estudios Avanzados Nanociencia IMD, Campus Cantoblanco, E-28049 Madrid, Spain
[2] Univ Tehran, Sch Elect & Comp Engn, Nanoelect Lab, Tehran 1439956191, Iran
[3] Ecole Polytech Fed Lausanne, Inst Elect Engn, CH-1015 Lausanne, Switzerland
[4] Ecole Polytech Fed Lausanne, Inst Mat Sci & Engn, CH-1015 Lausanne, Switzerland
[5] Inst Ciencia Mat Madrid ICMM CSIC, E-28049 Madrid, Spain
来源
ELECTRONICS | 2017年 / 6卷 / 02期
关键词
two dimensional materials; chemical vapor deposition; MoS2; reflectance; exciton; QUALITY MONOLAYER WS2; LARGE-AREA; ATOMIC LAYERS;
D O I
10.3390/electronics6020028
中图分类号
TP [自动化技术、计算机技术];
学科分类号
0812 ;
摘要
The growth of single-layer MoS2 with chemical vapor deposition is an established method that can produce large-area and high quality samples. In this article, we investigate the geometrical and optical properties of hundreds of individual single-layer MoS2 crystallites grown on a highly-polished sapphire substrate. Most of the crystallites are oriented along the terraces of the sapphire substrate and have an area comprised between 10 mu m(2) and 60 mu m(2). Differential reflectance measurements performed on these crystallites show that the area of the MoS2 crystallites has an influence on the position and broadening of the B exciton while the orientation does not influence the A and B excitons of MoS2. These measurements demonstrate that differential reflectance measurements have the potential to be used to characterize the homogeneity of large-area chemical vapor deposition (CVD)-grown samples.
引用
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页数:8
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