Time-resolved spatial distribution of plasma in the ablation of a Ba0.6Sr0.4TiO3 target by 25 ns KrF ultraviolet laser

被引：3
作者：
Lagrange, J. F. [1 ]
Hermann, J. [2 ]
Wolfman, J. [1 ]
Motret, O. [1 ]
机构：
[1] Univ Tours, Fac Sci & Tech, Grp Rech Mat Microelect Acoust & Nanotechnol GREM, UMR CNRS CEA 7347, F-37200 Tours, France
[2] Aix Marseille Univ, UMR CNRS 6182, Lab Lasers Plasmas & Proc Photon LP3, F-13288 Marseille, France
来源：
JOURNAL OF APPLIED PHYSICS | 2014年 / 116卷 / 13期
关键词：
EXPANSION DYNAMICS; THIN-FILMS; DIELECTRIC-CONSTANT; DEPOSITION; PLUME; TEMPERATURE; DIAGNOSTICS; PROPAGATION; EVOLUTION; THICKNESS;
D O I：
10.1063/1.4897223
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
We performed radially and longitudinally time-resolved plasma analysis during pulsed laser deposition of Ba0.6Sr0.4TiO3 thin films. The plasma is shown to be optically thick and strongly non-uniform during the early expansion phase and the resonance line Ba II (455.4 nm) is strongly self-reversed during this time. Plasma temperature and electron density were obtained by comparing experimental emission spectra with the spectral radiance computed for a non-uniform plasma in local thermal equilibrium. (C) 2014 AIP Publishing LLC.
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页数：7
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