Electron beam excitation in thin layered samples

被引:14
作者
Fitting, H-J
Cornet, N.
Salh, Roushdey
Guerret-Piecourt, C.
Goeuriot, D.
von Czarnowski, A.
机构
[1] Univ Rostock, Dept Phys, D-18051 Rostock, Germany
[2] Ecole Natl Super Mines, Ctr Mat Sci & Struct, F-42023 St Etienne 2, France
[3] Ecole Cent Lyon, Lab Ingn & Fonctionnalisat Surfaces, CNRS, UMR 5621, F-69134 Ecully, France
关键词
electron range; electron energy deposition; electron excitation functions; multilayer targets;
D O I
10.1016/j.elspec.2007.03.014
中图分类号
O433 [光谱学];
学科分类号
0703 ; 070302 ;
摘要
Energy transfer distributions dE/dx and respective excitation depth functions (P of electron beams in heterogeneous layered samples are described by a successive Effective Layer method. This method is based on electron transmission rates through the top multilayer system replaced by an "effective layer" of the following bottom material. Thus energy depositions in heterogeneous layered metal samples (Al, Ag and Au) and dielectric insulating samples SiO2-Al2O3 are given. For the latter ones special energy-range relations R(E-0) have been deduced for the common energy regions (1-30)keV of scanning electron microscopy (SEM). Application are given by cathodoluminescence depth profiling and electron beam charging of non-conductive samples. (c) 2007 Elsevier B.V. All rights reserved.
引用
收藏
页码:46 / 52
页数:7
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