Experimental investigation of a pulsed Rb-Ar excimer-pumped alkali laser

被引：4
作者：
Cheng, Hongling [1 ,2 ]
Wang, Zhimin [2 ]
Zhang, Fengfeng [2 ]
Wang, Mingqiang [2 ]
Tian, Zhaoshuo [1 ]
Peng, Qinjun [2 ]
Cui, Dafu [2 ]
Xu, Zuyan [2 ]
机构：
[1] Harbin Inst Technol Weihai, Informat Optoelect Res Inst, Weihai 264209, Shandong, Peoples R China
[2] Chinese Acad Sci, Tech Inst Phys & Chem, Key Lab Funct Crystal & Laser Technol, Res Ctr Laser Phys & Technol, Beijing 100190, Peoples R China
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS | 2017年 / 56卷 / 03期
关键词：
795-NM RUBIDIUM LASER; VAPOR LASER; MODEL; CS;
D O I：
10.7567/JJAP.56.032701
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
We present experimental results of an exciplex-pumped alkali laser (XPAL) at 780nm based on the 5(2)P(3/2) -> 5(2)S(1/2) transition of the Rb atom in mixtures of Rb vapor and Ar. A laboratory-built Ti: sapphire laser with a pulse repetition rate of 3 kHz and a pulse width of 100 ns is used as the pump source. The maximum laser pulse energy of 0.26 mu J at 780nm is obtained under an absorbed pump pulse energy of 42 mu J at 755nm in mixtures of Rb vapor and Ar at a temperature of 423 K, corresponding to an optical conversion efficiency of 0.62%. Further experiments show that the output laser at 780nm can always be detected for pump wavelengths ranging from 754 to 759 nm, indicating that Rb-Ar mixtures can be effectively pumped by commercial laser diodes ( LDs) with a bandwidth of 5 nm. (C) 2017 The Japan Society of Applied Physics
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页码：1 / +
页数：4
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