Increased power from deep ultraviolet LEDs via precursor selection

被引:12
作者
Moe, C. [1 ]
Onuma, T.
Vampola, K.
Fellows, N.
Masui, H.
Newman, S.
Keller, S.
Chichibu, S. F.
DenBaars, S. P.
Emerson, D.
机构
[1] Univ Calif Santa Barbara, Santa Barbara, CA 93106 USA
[2] Univ Tsukuba, Inst Appl Phys, Tsukuba, Ibaraki 3058573, Japan
[3] Univ Tsukuba, Grad Sch Pure & Appl Sci, Tsukuba, Ibaraki 3058573, Japan
[4] Cree, Durham, NC USA
关键词
metalorganic chemical vapor deposition; nitrides; light emitting diodes;
D O I
10.1016/j.jcrysgro.2006.10.126
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
Deep ultraviolet AlGaN multiple quantum wells as well as single Al0.5Ga0.5N layers were grown at varying growth rates using both trimethylgallium (TMGa) and triethylgallium (TEGa) as precursors. The incorporation efficiency of the two precursors was compared, as well as the impurity concentrations measured by secondary ion mass spectroscopy (SIMS). The electronic transport properties of each were examined. Photoluminescence of quantum wells was also performed, with an efficiency increase with decreasing growth rate observed for quantum wells grown with TMGa. Wells grown using TEGa, although significantly more efficient at high growth rates than those using TMGa, showed no variation in intensity across growth rates and were surpassed in light output by TMGa quantum wells grown at a sufficiently slow rate. LEDs were grown using both precursors, resulting in a four-fold increase in measured brightness over previously reported results from this university. (c) 2006 Published by Elsevier B.V.
引用
收藏
页码:710 / 713
页数:4
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