Enhanced charge-discharge characteristics of RuO2 supercapacitors on heat-treated TiO2 nanorods

被引:43
作者
Ahn, Young Rack
Park, Chong Rae
Jo, Seong Mu
Kim, Dong Young [1 ]
机构
[1] Korea Inst Sci & Technol, Optoelect Mat Res Ctr, Seoul 136791, South Korea
[2] Seoul Natl Univ, Sch Mat Sci & Engn, Seoul 151742, South Korea
关键词
D O I
10.1063/1.2715038
中图分类号
O59 [应用物理学];
学科分类号
摘要
Electrochemical capacitors based on RuO2 were prepared onto electrospun TiO2 nanorods. Further heat treatment of the TiO2 at 800 degrees C under nitrogen was found to greatly improve the electrochemical performance of the RuO2 electrodes, especially at fast charge-discharge rates. The specific capacitance was found to decrease by only 33% when the scan rate increased from 10 to 1000 mV s(-1) (from 687 to 460 F g(-1)). The characteristic response time of the RuO2 electrode was found to be 0.15 s when a heat-treated TiO2 substrate was used, which is 20 times better than that of the pristine TiO2 used. (c) 2007 American Institute of Physics.
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页数:3
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