Determination of excess current due to impact ionization in polycrystalline silicon thin-film transistors

被引:8
作者
Policicchio, I
Pecora, A
Carluccio, R
Mariucci, L
Fortunato, G
Plais, F
Pribat, D
机构
[1] IESS CNR, I-00156 Rome, Italy
[2] Thomson CSF, Domaine De Coberville, France
关键词
D O I
10.1016/S0038-1101(97)00262-1
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Polysilicon thin-film transistors (TFTs) are of great interest for their circuit application in the large area microelectronics. A successful circuit design requires an accurate prediction of the circuit performances, which in turn needs a proper modeling of the electrical device characteristics. In this present work the specific aspects of the anomalous current increase in the output characteristics, often called the "kink" effect? are analysed. A new procedure to determine the excess current is presented and we analysed the excess current for different Sate voltages, temperatures and device geometries. We show that, from the parameters that call be extracted by analysing a reduced set of experimental data, the excess current can be easily predicted for any bias and temperature condition and also for devices with different geometries; These results can be used to further up-grade the modeling of the electrical characteristics of polysilicon TFTs in circuit simulators. (C) 1998 Elsevier Science Ltd. All rights reserved.
引用
收藏
页码:613 / 618
页数:6
相关论文
共 20 条
[1]   A comparison of the kink effect in polysilicon thin film transistors and silicon on insulator transistors [J].
Armstrong, GA ;
Brotherton, SD ;
Ayres, JR .
SOLID-STATE ELECTRONICS, 1996, 39 (09) :1337-1346
[2]   DEPENDENCE OF CHANNEL ELECTRIC-FIELD ON DEVICE SCALING [J].
CHAN, TY ;
KO, PK ;
HU, C .
IEEE ELECTRON DEVICE LETTERS, 1985, 6 (10) :551-553
[3]   ANALYSIS AND CONTROL OF FLOATING-BODY BIPOLAR EFFECTS IN FULLY DEPLETED SUBMICROMETER SOI MOSFETS [J].
CHOI, JY ;
FOSSUM, JG .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1991, 38 (06) :1384-1391
[4]   REDUCTION OF KINK EFFECT IN THIN-FILM SOI MOSFETS [J].
COLINGE, JP .
IEEE ELECTRON DEVICE LETTERS, 1988, 9 (02) :97-99
[5]  
FORTUNATO G, 1996, SOLID STATE PHENOM, V51, P585
[6]   AVALANCHE-INDUCED EFFECTS IN POLYSILICON THIN-FILM TRANSISTORS [J].
HACK, M ;
LEWIS, AG .
IEEE ELECTRON DEVICE LETTERS, 1991, 12 (05) :203-205
[7]   A UNIFIED CIRCUIT MODEL FOR THE POLYSILICON THIN-FILM TRANSISTOR [J].
IZZARD, MJ ;
MIGLIORATO, P ;
MILNE, WI .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1991, 30 (2A) :L170-L171
[8]   DEVICE QUALITY SIO2 DEPOSITED BY DISTRIBUTED ELECTRON-CYCLOTRON RESONANCE PLASMA ENHANCED CHEMICAL VAPOR-DEPOSITION WITHOUT SUBSTRATE HEATING [J].
JIANG, N ;
HUGON, MC ;
AGIUS, B ;
KRETZ, T ;
PLAIS, F ;
PRIBAT, D ;
CARRIERE, T ;
PUECH, M .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1992, 31 (10A) :L1404-L1407
[9]  
KOYANAGI M, 1991, P IEDM 91, V571
[10]  
KRETZ T, 1994, SOLID STATE PHENOM, V311, P37