Fabrication of 3D microstructures with inclined/rotated UV lithography

被引：0

作者：

Han, M ^{[1
]}

Lee, W ^{[1
]}

Lee, SK ^{[1
]}

Lee, SS ^{[1
]}

机构：

[1] Pohang Univ Sci & Technol, Dept Mech Engn, Nam Gu, Pohang 790784, Kyungbuk, South Korea

来源：

MEMS-03: IEEE THE SIXTEENTH ANNUAL INTERNATIONAL CONFERENCE ON MICRO ELECTRO MECHANICAL SYSTEMS | 2003年

关键词：

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

This paper presents a novel microfabrication technology of three-dimensional (3D) microstructures with inclined/rotated UV lithography. Various 3D microstructures have been made of negative thick photoresist, SU-8, using single inclined, double inclined, or inclined & rotated UV lithography. In some cases, we also exploit the UV reflected by the substrate as well as the incident UV from the source to form various microstructures. With the 3D microfabrication technology, various 3D microstructures are simply and easily fabricated such as oblique cylinders, embedded channels, bridges, V-grooves, truncated cones, and so on.

引用

页码：554 / 557

页数：4

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