Combinatorial Discovery and Optimization of Amorphous HfO2-Nb2O5 Mixture with Improved Transparency

被引：15

作者：

Dabirian, Ali ^{[1
]}

Kuzminykh, Yury ^{[1
]}

Afra, Bamdad ^{[1
]}

Harada, Scott ^{[1
]}

Wagner, Estelle ^{[2
]}

Sandu, Cosmin S. ^{[1
]}

Benvenuti, Giacomo ^{[2
]}

Rushworth, Simon ^{[3
]}

Muralt, Paul ^{[1
]}

Hoffmann, Patrik ^{[1
,4
]}

机构：

[1] Ecole Polytech Fed Lausanne, CH-1015 Lausanne, Switzerland

[2] ABCD Technol Sarl, CH-1207 Geneva, Switzerland

[3] SAFC Hitech Ltd, Wirral CH62 3QF, Merseyside, England

[4] Swiss Fed Labs Mat Testing & Res EMPA, CH-3602 Thun, Switzerland

来源：

ELECTROCHEMICAL AND SOLID STATE LETTERS | 2010年 / 13卷 / 07期

关键词：

CHEMICAL-VAPOR-DEPOSITION; THIN-FILMS; STRUCTURE EVOLUTION; OPTICAL-PROPERTIES; GATE DIELECTRICS; OXIDES; MIRRORS;

D O I：

10.1149/1.3407618

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

Combinatorial high vacuum chemical vapor deposition (HV-CVD) of mixed HfO2-Nb2O5 thin films has been demonstrated to yield amorphous layers at substrate temperatures where individually deposited pure HfO2 and Nb2O5 films are polycrystalline. Spectroscopic ellipsometry of the films shows that adding HfO2 to Nb2O5 improves the transparency of the films while still maintaining a high refractive index. Atomic force microscopy measurements show that the root-mean-square surface roughness of the films is about 1.2 nm. (C) 2010 The Electrochemical Society. [DOI: 10.1149/1.3407618] All rights reserved.

引用

页码：G60 / G63

页数：4

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