Mechanism of hydrogen production via water splitting on 3C-SiC's different surfaces: A first-principles study

被引:15
|
作者
Du, Jinglian [1 ]
Wen, Bin [1 ]
Melnik, Roderick [2 ,3 ,4 ]
机构
[1] Yanshan Univ, State Key Lab Metastable Mat Sci & Technol, Qinhuangdao 066004, Peoples R China
[2] Wilfrid Laurier Univ, Lab M2NeT, Waterloo, ON N2L 3C5, Canada
[3] Ikerbasque, Basque Fdn Sci, Bilbao 48011, Spain
[4] BCAM, Bilbao 48011, Spain
基金
中国国家自然科学基金; 加拿大自然科学与工程研究理事会;
关键词
Water splitting; Photocatalyst; 3C-SiC; Reaction mechanism; First-principles calculation; TIO2; ADSORPTION; PHOTOLYSIS; CARBON; OXIDE;
D O I
10.1016/j.commatsci.2014.08.018
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The reaction mechanism of producing hydrogen via water splitting on the different surfaces of cubic silicon carbide (3C-SiC), the adsorption energy and the activation energy have been studied here by using density functional theory. The results indicated that the adsorption behavior of water molecule could take place on 3C-SiC's different surfaces and it leads to the surface reconstruction. Besides, the water splitting reaction is found to be a thermally activated process, and the first hydrogen atom is easier decomposing from the adsorbed water molecule than the second one for most of the 3C-SiC surfaces. Furthermore, the water molecule that splitting on 3C-SiC (111) surface requires relatively small activation energy by contrast with other surfaces. Photon excitation is considered to be essential for the overall water splitting reaction to proceed further. Crown Copyright (C) 2014 Published by Elsevier B.V. All rights reserved.
引用
收藏
页码:451 / 455
页数:5
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