A gate-width scalable 90-nm MOSFET nonlinear model including DC/RF dispersion effects valid up to 50 GHz
被引:5
作者:
Yu, Panpan
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机构:
East China Normal Univ, Sch Informat Sci & Technol, Shanghai 200062, Peoples R ChinaEast China Normal Univ, Sch Informat Sci & Technol, Shanghai 200062, Peoples R China
Yu, Panpan
[1
]
Sun, Ling
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机构:
Nantong Univ, Jiangsu Key Lab ASIC Design, Nantong 226019, Peoples R ChinaEast China Normal Univ, Sch Informat Sci & Technol, Shanghai 200062, Peoples R China
Sun, Ling
[2
]
Tian, Xuenong
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机构:
Univ Sci & Technol Suzhou, Sch Elect & Informat Engn, Suzhou 215000, Peoples R ChinaEast China Normal Univ, Sch Informat Sci & Technol, Shanghai 200062, Peoples R China
Tian, Xuenong
[3
]
Cheng, Jiali
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机构:
Huaihai Inst Technol, Marine Resources Dev Inst Jiangsu, Lianyungang 222005, Peoples R ChinaEast China Normal Univ, Sch Informat Sci & Technol, Shanghai 200062, Peoples R China
Cheng, Jiali
[4
]
Gao, Jianjun
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机构:
East China Normal Univ, Sch Informat Sci & Technol, Shanghai 200062, Peoples R ChinaEast China Normal Univ, Sch Informat Sci & Technol, Shanghai 200062, Peoples R China
Gao, Jianjun
[1
]
机构:
[1] East China Normal Univ, Sch Informat Sci & Technol, Shanghai 200062, Peoples R China
[2] Nantong Univ, Jiangsu Key Lab ASIC Design, Nantong 226019, Peoples R China
[3] Univ Sci & Technol Suzhou, Sch Elect & Informat Engn, Suzhou 215000, Peoples R China
[4] Huaihai Inst Technol, Marine Resources Dev Inst Jiangsu, Lianyungang 222005, Peoples R China
MOSFETs;
Nonlinear modeling;
Capacitance;
Dispersion effect;
PARAMETER EXTRACTION METHOD;
SIGNAL EQUIVALENT-CIRCUIT;
ANALOG INTEGRATED-CIRCUIT;
GAAS-MESFET MODEL;
FREQUENCY-DISPERSION;
CHARGE CONSERVATION;
SERIES RESISTANCE;
SILICON MOSFET;
SIMULATION;
CAD;
D O I:
10.1016/j.sse.2017.06.029
中图分类号:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号:
0808 ;
0809 ;
摘要:
An improved deep sub-micrometer (90 nm) large signal model for silicon-based MOSFET that incorporates DC/AC dispersion model is proposed. The derived DC model can accurately predict the device current-voltage behavior over the wide range of bias points and the corresponding extraction method for model parameters is investigated. The improvement also consists of new equations for the nonlinear capacitance phenomenon in the saturation region using few fitting parameters, and emphasizes for the particularly difficult problems associated with the DC/RF dispersion. Model verification is carried out by comparison of measured and simulated S-parameters for 90 nm gate-length MOSFET devices point up to 50 GHz. Good agreement is obtained between measured and modeled results and the scalability of model is also verified in this paper. (C) 2017 Elsevier Ltd. All rights reserved.
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页码:53 / 64
页数:12
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Pohang Univ Sci & Technol, Gyeongbuk 790784, South KoreaPohang Univ Sci & Technol, Gyeongbuk 790784, South Korea
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机构:
Pohang Univ Sci & Technol, Gyeongbuk 790784, South Korea
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Pohang Univ Sci & Technol, Gyeongbuk 790784, South KoreaPohang Univ Sci & Technol, Gyeongbuk 790784, South Korea
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h-index: 0
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NCNT, Gyeongbuk 790784, South KoreaPohang Univ Sci & Technol, Gyeongbuk 790784, South Korea
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Jung, Sung-Woo
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机构:Pohang Univ Sci & Technol, Gyeongbuk 790784, South Korea
Jung, Sung-Woo
Jeong, Yoon-Ha
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机构:
Pohang Univ Sci & Technol, Gyeongbuk 790784, South Korea
NCNT, Gyeongbuk 790784, South KoreaPohang Univ Sci & Technol, Gyeongbuk 790784, South Korea